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Volumn 211, Issue 2, 2003, Pages 161-166

Preparation of site-specific cross-sections of heterogeneous catalysts prepared by focused ion beam milling

Author keywords

Cross sections; Focused ion beam milling; Heterogeneous catalysts; Transmission electron microscopy

Indexed keywords

CATALYSTS; GRINDING (MACHINING); HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY; IONS; MILLING (MACHINING);

EID: 0042659538     PISSN: 00222720     EISSN: None     Source Type: Journal    
DOI: 10.1046/j.1365-2818.2003.01216.x     Document Type: Article
Times cited : (17)

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    • (1997) Mater. Res. Symp. Proc. , vol.480 , pp. 19
    • Giannuzzi, L.A.1    Drown, J.L.2    Brown, S.R.3    Irwin, R.B.4    Shofner, T.L.5    Stevie, F.A.6
  • 3
    • 0035441752 scopus 로고    scopus 로고
    • Preparation of transmission electron microscopy cross-section specimens using focussed ion beam milling
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    • (2001) J. Vac. Sci. Technol. A , vol.19 , pp. 2186-2193
    • Langford, M.1    Petford-Long, A.K.2
  • 4
    • 0000923306 scopus 로고
    • Novel scheme for the preparation of transmission electron microscope specimens with a focused ion beam
    • Overwijk, M.H.F., van den Heuvel, F.C. & Bulle-Lieuwma, C.W.T. (1993) Novel scheme for the preparation of transmission electron microscope specimens with a focused ion beam. J. Vac. Sci. Technol. B11, 2021-2024.
    • (1993) J. Vac. Sci. Technol. , vol.B11 , pp. 2021-2024
    • Overwijk, M.H.F.1    Van Den Heuvel, F.C.2    Bulle-Lieuwma, C.W.T.3
  • 5
    • 0000971911 scopus 로고
    • Cross-sectional TEM specimen preparation of semi-conductor devices by focused ion beam etching
    • Park, K.H. (1990) Cross-sectional TEM specimen preparation of semi-conductor devices by focused ion beam etching. Mater. Res. Symp. Proc. 199, 271-280.
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    • Park, K.H.1
  • 6
    • 0035878343 scopus 로고    scopus 로고
    • FIB preparation of a sensitive porous catalyst for TEM elemental mapping at high magnifications
    • Smith, A.J., Munroe, P. & Tran, T. (2001) FIB preparation of a sensitive porous catalyst for TEM elemental mapping at high magnifications. J. Mat. Sci. 36, 3519-3524.
    • (2001) J. Mat. Sci. , vol.36 , pp. 3519-3524
    • Smith, A.J.1    Munroe, P.2    Tran, T.3
  • 7
    • 0000900485 scopus 로고
    • Focused ion beam micromachining for transmission electron microscopy specimen preparation of semiconductor laser diodes
    • Szot, J., Hornsey, R., Ohnishi, T. & Minagawa, J. (1992) Focused ion beam micromachining for transmission electron microscopy specimen preparation of semiconductor laser diodes. J. Vac. Sci. Technol. B10, 575-579.
    • (1992) J. Vac. Sci. Technol. , vol.B10 , pp. 575-579
    • Szot, J.1    Hornsey, R.2    Ohnishi, T.3    Minagawa, J.4
  • 8
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    • Fabrication of planar and cross-sectionalTEM specimens using a focused ion beam
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    • Young, R.J.1    Kirk, E.C.G.2    Williams, D.A.3    Ahmed, H.4


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.