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Volumn 17, Issue 15-16, 1997, Pages 1781-1785

MOCVD growth of high quality GaN-AlGaN based structures on Al2O3 substrates with dislocation density less than 107 cm-2

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EID: 0042638197     PISSN: 09552219     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0955-2219(97)00076-9     Document Type: Article
Times cited : (5)

References (13)
  • 1
    • 0027574150 scopus 로고
    • Thin films and devices of diamond, silicon carbide and gallium nitride
    • Davis, R. F., Thin films and devices of diamond, silicon carbide and gallium nitride. Physica B, 1993, 185, 1-15.
    • (1993) Physica B , vol.185 , pp. 1-15
    • Davis, R.F.1
  • 2
    • 0041347077 scopus 로고
    • Exploration of entire range of III-V semiconductors and their device applications
    • Razeghi, M., Choi, Y. H., He, X. and Sun, C. J., Exploration of entire range of III-V semiconductors and their device applications. Materials Science and Technology, 1995, 11, 3-30.
    • (1995) Materials Science and Technology , vol.11 , pp. 3-30
    • Razeghi, M.1    Choi, Y.H.2    He, X.3    Sun, C.J.4
  • 3
    • 0029377278 scopus 로고
    • High-power ImGaN single-quantum-well-structure blue and violet light-emitting diodes
    • Nakamura, S., Senoh, M., Twasa, N. and Nagahama, S. I., High-power ImGaN single-quantum-well-structure blue and violet light-emitting diodes. Appl. Phys. Lett., 1995, 67, 1868-1870.
    • (1995) Appl. Phys. Lett. , vol.67 , pp. 1868-1870
    • Nakamura, S.1    Senoh, M.2    Twasa, N.3    Nagahama, S.I.4
  • 8
    • 0029637531 scopus 로고
    • High dislocation densities in high efficiency GaN-based light-emitting diodes
    • Lester, S. D., Ponce, F. A., Craford, M. G. and Steigerwald, D. A., High dislocation densities in high efficiency GaN-based light-emitting diodes. Appl. Phys. Lett., 1995, 66, 1249-1251.
    • (1995) Appl. Phys. Lett. , vol.66 , pp. 1249-1251
    • Lester, S.D.1    Ponce, F.A.2    Craford, M.G.3    Steigerwald, D.A.4
  • 10
    • 0029307045 scopus 로고
    • High quality AlN and GaN epilayers grown on (00 • 1) sapphire, (100), and (111) silicon substrates
    • Kung, P., Saxler, A., Zhang, X., Walker, D., Wang, T. C., Ferguson, I. and Razeghi, M., High quality AlN and GaN epilayers grown on (00 • 1) sapphire, (100), and (111) silicon substrates. Appl. Phy. Lett., 1995, 66, 2958-2960.
    • (1995) Appl. Phy. Lett. , vol.66 , pp. 2958-2960
    • Kung, P.1    Saxler, A.2    Zhang, X.3    Walker, D.4    Wang, T.C.5    Ferguson, I.6    Razeghi, M.7
  • 12
    • 36449001002 scopus 로고
    • High quality aluminum nitride epitaxial layers grown on sapphire substrates
    • Saxler, A., Kung, P., Sun, C. J., Bigan, E. and Razeghi, M., High quality aluminum nitride epitaxial layers grown on sapphire substrates. Appl. Phys. Lett., 1994, 64, 339-341.
    • (1994) Appl. Phys. Lett. , vol.64 , pp. 339-341
    • Saxler, A.1    Kung, P.2    Sun, C.J.3    Bigan, E.4    Razeghi, M.5


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.