Low cost RF MEMS switches using photodefinable mixed oxide dielectrics

IEEE MTT-S International Microwave Symposium Digest

Volumn 3, Issue , 2003, Pages 1633-1636

  Wang, Guoan ^a   Barstow, Sean ^b   Jeyakumar, Augustin ^b   Papapolymerou, John ^a   Henderson, Cliff ^b  

^a GEORGIA INSTITUTE OF TECHNOLOGY   (United States)

^b Georgia Institute of Technology   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DIELECTRIC LOSSES; ELECTRIC CONDUCTIVITY; ELECTRIC SWITCHES; PERMITTIVITY; PHOTOSENSITIVITY; SILICON WAFERS;

PRECURSORS;

MICROELECTROMECHANICAL DEVICES;

EID: 0042592914     PISSN: 0149645X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (9)

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2. R. N. Tait, "An IC-compatible process for fabrication of RF switches and tunable capacitors", CanJ.Elect & Comp. Eng., Vol 25, No. 1, January 2000.
3. C. Goldsmith et al, "Performance of Low Loss RF MEMS Capacitive Switches," IEEE Microwave and Guided Wave Letters, vol. 8, no. 8, pp. 269-271, August 1998.
4. Shyh-Chiang Shen and Milton Feng, " Low Actuation Voltage RF MEMS Switches With Signal Frequencies From 0.25 GHZ to 40 GHz", Electron Devices Meeting, 1999. IEDM Technical Digest. International , 1999 Page(s): 689-692
5. D. Belaraman, S. Bhattacharya, F. Ayazi and J. Papapolymerou, "Low cost, low actuation voltage Copper RF MEMS Switches," 2002 IEEE Intl. Microwave Symposium Digest, pp. 1225-1228, vol. 2.
6. C. Goldsmith et al, "Lifetime characterization of capacitive RF MEMS switches," 2001 IEEE Intl. Microwave Symposium Digest, pp. 227-230, vol. 1.
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9. S. J. Barstow, A. Jeyakumar, C. L. Henderson, "Direct photopatterning of metal oxide materials using photosensitive organometallic precursor films," Proc. SPIE-Emerging Lithographic Technologies VI , pp. 421-430, 2002.