Direct photopatterning of metal oxide materials using photosensitive organometallic precursor films

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4688, Issue 1, 2002, Pages 421-430

  Barstow, Sean J ^a   Jeyakumar, Augustin ^a   Henderson, Clifford L ^a  

^a Georgia Institute of Technology   (United States)

Author keywords

BST; Organometallic; Oxide; Photosensitive; Solution deposition; Spin on

Indexed keywords

CAPACITORS; ETCHING; LOW TEMPERATURE EFFECTS; MASKS; NATURAL FREQUENCIES; ORGANOMETALLICS; PERMITTIVITY; PHOTOCHEMICAL REACTIONS; PHOTOLITHOGRAPHY; PHOTOSENSITIVITY; POROSITY; PRESSURE EFFECTS; REFRACTIVE INDEX; SEMICONDUCTING SILICON; ULTRAVIOLET RADIATION; X RAY PHOTOELECTRON SPECTROSCOPY;

MIXED METAL OXIDES;

THIN FILMS;

EID: 0036380127     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.472317     Document Type: Conference Paper

References (15)

1. 3 thin films using inductively coupled plasma," J. Vac. Sci. Technol. A., vol. 19, pp. 1063-7, 2001.
2. 3 capacitor for 1Gb and beyond [DRAMs]," presented at International Electron Devices Meeting 1998. Technical Digest, San Francisco, CA, 1998.
3. S. Schneider, M. A. Kennard, R. Waser, R. W. Schwartz, P. C. McIntyre, Y. Miyasaka, S. R. Summerfelt, and D. Wouters, "Anisotropic plasma etching of barium-strontium-titanate thin films for 4 Gbit DRAM devices," presented at Ferroelectric Thin Films VIII. Symposium (MRS Symposium Proceedings), Boston, MA, 2000.
4. V. Balzani, Photochemistry of Coordination Compounds. New York, NY: Academic Press, 1970.
5. A.A. Avey and R. H. Hill, "Solid State Photochemistry of Cu2(OH)2(O2C(CH2)4CH3)4 in Thin Films: The Photochemical Formation of High-Quality Films of Copper and Copper(I) Oxide. Demonstration of a Novel Lithographic Technique for the Patterning of Copper.," J. Am. Chem. Soc., vol. 188, pp. 237-238, 1996.
6. A. Lachish-Zalalt, D. Zbaida, E. Klein, and M. Elbaum, "Direct surface patterning from solutions: localized microchemistry using a focused laser," Advanced Functional Materials, vol. 11, pp. 218-23, 2001.
7. D. Young, H. D. Wu, R. C. Y. Auyeung, R. Modi, J. Fitz-Gerald, A. Pique, D. B. Chrisey, P. Atanassova, and T. Kodas, "Dielectric properties of oxide structures by laser-based direct-writing method," J. Mat. Res., vol. 16, pp. 1720-5, 2001.
8. L. Zhou, G. Q. Xu, H. T. Ng, and S. F. Y. Li, "Scanning thermal microscope tip-induced chemical reaction on solid organometallic compound thin films," J. Vac. Sci. Technol. B, vol. 15, pp. 1871-5, 1997.
9. R.C.Y. Auyeung, H. D. Wu, R. Modi, A. Pique, J. M. Fitz-Gerald, H. D. Young, S. Lakeou, R. Chung, and D. B. Chrisey, "Matrix-assisted laser transfer of electronic materials for direct-write," presented at First International Symposium on Laser Precision Microfabrication, Omiya, Japan, 2000.
10. L.-K. Wu, B.-C. Tseng, and L.-C. Liao, "Integral passives in multi-dielectric substrate," presented at 2000 International Symposium on Microelectronics, Boston, MA, 2000.
11. E.J. Reardon and R. W. Capenter, "Novel thin film materials and processes for integral (embedded) resistors and capacitors," presented at Electronics Circuits World Convention 8, Tokyo, Japan, 1999.
12. st Electronic Components and Technology Conference, Orlando, FL, 2001.
13. S. Ogitani, S. A. B. Allen, and P. A. Kohl, "Development of high-k composite for integral capacitors," presented at IPC Printed Circuits Expo, San Diego, CA, 2000.
14. M. Gao and R. H. Hill, J. Photochem. Photobiol. A: Chem., vol. 97, pp. 73, 1996.
15. Y. Shi, S. L. Blair, I. Yaroslavsky, R. H. Hill, P. N. Kumta, A. F. Hepp, D. B. Beach, B. Arkles, and J. J. Sulivan, presented at Chem. Aspects of Elec. Ceramics Proc. Symp., Boston, MA, 1998.