Microwave plasma cleaning of ion implant ceramic insulators

Vacuum

Volumn 49, Issue 4, 1998, Pages 273-278

  Law, V J ^a   Tait, D ^b  

^a Cambridge Fluid Systems   (United Kingdom)

^b MOTOROLA   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0042546155     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0042-207x(98)00108-0     Document Type: Article

References (10)

1. For further details of participating companies correspondence should be directed to principle author.
2. Law, V. J. and Tait, D., European Semiconductor, 1998, 19, S38. Angel Business Communications, London.
3. Braithwaite, N. St J., Booth, J. P. and Cunge, G., Plasma Sources Sci. Technol., 1996, 5, 677.
4. Zakrzewski, Z., Moisan, M., Margot, J. and Sauve, G., Plasma Sources Sci. Technol., 1992, 1, 28.
5. Okamoto, Y., Plasma Sources Sci. Technol., 1996, 5, 648.
6. Law, V. J., Vacuum, 1998, 49(3), 217.
7. See for example : Harsbarger, W. R., Porter, R. A., Miller, T. A. and Norton, P., Applied Spectroscopy, 1977, 31, 201 ; Coburn, J. W. and Winters, H. F., J. Vac. Sci. Technol., 1979, 16, 391.
8. See for example : Harsbarger, W. R., Porter, R. A., Miller, T. A. and Norton, P., Applied Spectroscopy, 1977, 31, 201 ; Coburn, J. W. and Winters, H. F., J. Vac. Sci. Technol., 1979, 16, 391.
9. Biondi, M. A., Phys. Rev., 1953, 93, 1136.
10. Handbook of Chemistry and Physics, 1989, 60th edn, ed. R. C. Weast. CRC Press, Florida.