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Volumn 49, Issue 3, 1998, Pages 217-220

Ultraviolet fluorescence microwave plasma probe

Author keywords

[No Author keywords available]

Indexed keywords


EID: 0042997106     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0042-207x(97)00167-x     Document Type: Article
Times cited : (3)

References (11)
  • 1
    • 0012757283 scopus 로고
    • Chau, T. T., Chan, K. W. and Kao, K. C., J. Vac. Sci. Technol., 1995, B13, 2219. Lee, W. P., Khong, T. L., Muhamed, M. R. and Tou, T. Y., J. Electrochem. Soc., 1997, 144, L103.
    • (1995) J. Vac. Sci. Technol. , vol.B13 , pp. 2219
    • Chau, T.T.1    Chan, K.W.2    Kao, K.C.3
  • 4
    • 85177133235 scopus 로고
    • Meunier, J., Belenguer, Ph. and Boeuf, J. P., J. Appl. Phys., 1995, 78(1), 731. Sobel, A., IEEE Trans. Plasma. Sci., 1991, 19, 10,342.
    • (1991) IEEE Trans. Plasma. Sci. , vol.19 , pp. 10342
    • Sobel, A.1
  • 7
    • 85030057951 scopus 로고    scopus 로고
    • Angel Business Communications Ltd, London
    • Law, V. J., European Semiconductor, 1997, 19(9), S38-S41. Angel Business Communications Ltd, London.
    • (1997) European Semiconductor , vol.19 , Issue.9
    • Law, V.J.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.