Properties of molybdenum nitride thin film deposited by reactive sputter deposition

Materials Research Society Symposium - Proceedings

Volumn 750, Issue , 2002, Pages 307-312

  Wang, Yimin ^a   Seok, Jin W ^a   Lin, Ray Y ^a  

^a 705 Engineering Research Center   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; MOLYBDENUM COMPOUNDS; MORPHOLOGY; NITROGEN; SCANNING ELECTRON MICROSCOPY; SILICON WAFERS; SPUTTER DEPOSITION;

REACTIVE SPUTTER DEPOSITION;

THIN FILMS;

EID: 0042466707     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-750-y5.11     Document Type: Conference Paper

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