Effect of discharge current on the microstructure of diamond films deposited on aluminum substrate at low substrate température by dc plasma cvd

Japanese Journal of Applied Physics

Volumn 30, Issue 1, 1991, Pages L45-L48

  Nakao, Setsuo ^a   Watatani, Hirohumi ^a   Maruno, Shigeo ^a   Noda, Mikio ^b  

^a NAGOYA INSTITUTE OF TECHNOLOGY   (Japan)

^b AICHI UNIVERSITY OF EDUCATION   (Japan)

Author keywords

DC plasma Chemical vapor d position; Diamond d position at low substrate temp ra ture; Diamond d position on Al substrate; Diamond film; Microcrystalline diamond crystals; Microstructure of diamond film

Indexed keywords

ALUMINUM AND ALLOYS; ELECTRIC DISCHARGES; FILMS--CHEMICAL VAPOR DEPOSITION; MICROSCOPIC EXAMINATION--SCANNING ELECTRON MICROSCOPY; PLASMA DEVICES;

DISCHARGE CURRENTS;

DIAMONDS;

EID: 0025791883     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.30.L45     Document Type: Article

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