Characterization of tungsten oxide films produced by reactive pulsed laser deposition

Applied Surface Science

Volumn 218, Issue 1-4, 2003, Pages 282-290

  Soto, G ^a,b   De La Cruz, W ^a   Diaz J A ^a   Machorro, R ^a   Castillon F F ^a   Farias M H ^a  

^a CENTRO DE CIENCIAS DE LA MATERIA CONDENSADA   (Mexico)

^b UNIVERSIDAD NACIONAL AUTÓNOMA DE MÉXICO   (Mexico)

Author keywords

AES; Characterization methods; Deposition conditions; EELS; Optical properties; Pulsed laser deposition; Tungsten oxide; XPS

Indexed keywords

ANNEALING; AUGER ELECTRON SPECTROSCOPY; ELECTRON ENERGY LOSS SPECTROSCOPY; OPTICAL PROPERTIES; PULSED LASER DEPOSITION; STOICHIOMETRY; TUNGSTEN COMPOUNDS; X RAY PHOTOELECTRON SPECTROSCOPY;

DEPOSITION PRESSURE;

THIN FILMS;

EID: 0042193577     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(03)00677-9     Document Type: Article

References (21)

1. P.M.S. Monk, R.J. Mortimer, D.R. Rosseinsky, Electrochromism Fundamentals and Applications, VCH, New York, 1995.
2. C.G. Grandqvist, Handbook of Inorganic Electrochromics Materials, Elsevier, Amsterdam, 1995.
3. Durrani S.M.A., Khawaja E.E., Salim M.A., Al-Kuhaili M.F., Al-Shukri A.M. Sol. Energy Mater. Sol. Cells. 71:2002;313-325.
4. Bange K. Sol. Energy Mater. Sol. Cells. 58:1999;1.
5. Soto G., Díaz J.A., Machorro R., Reyes-Serrato A., de la Cruz W. Matt. Lett. 52:2002;29.
6. Scofield J.H. J. Electron Spectrosc. Relat. Phenom. 8:1976;129.
7. Powell C.J., Jablonski A., Tilinin I.S., Tanuma S., Penn D.R. J. Electron Spectrosc. Relat. Phenom. 98-99:1999;1.
8. Repoux M., Darque-Ceretti E., Casamassima M., Contour J.P. Surf. Interface Anal. 16:1990;209.
9. L.E. Davis, N.C. MacDonald, P.W. Palmberg, G.E. Riach, R.E. Weber, Handbook of Auger Electron Spectroscopy, Perkin-Elmer, Eden Praire, MN, 1978.
10. Shen Y.G., Mai Y.W. Mater. Sci. Eng. A. 284:2000;176-183.
11. J.F. Moulder, W.F. Stickle, P.E. Sobol, K.D. Bomben, in: J. Chastain (Ed.), Handbook of X-ray Photoelectron Spectroscopy, Perkin-Elmer, Eden Praire, MN, 1992.
12. Temmink A., Anderson O., Bange K., Hantsche H., Yu X. Thin Solid Films. 192:1990;211.
13. Temmink A., Anderson O., Bange K., Hantsche H., Yu X. Vacuum. 41:1990;1144.
14. Wittwer V., Schirmer O.F., Schlotter P. Solid State Commun. 25:1978;977.
15. Schirmer O.F., Wittwer V., Baur G., Brandt G. J. Electrochem. Soc. 124:1977;749.
16. R.F. Egerton, Electron Energy Loss Spectroscopy in Electron Microscope, second ed., Plenum Press, New York, 1996; Shen Y.G., Mai Y.W. Mater. Sci. Eng. A. 284:2000;176-183.
17. R.F. Egerton, Electron Energy Loss Spectroscopy in Electron Microscope, second ed., Plenum Press, New York, 1996; Shen Y.G., Mai Y.W. Mater. Sci. Eng. A. 284:2000;176-183.
18. C. Kittel, Introduction to Solid State Physics, sixth ed., Wiley, New York, 1986.
19. Hashimoto S., Matsuoka H. J. Appl. Phys. 69:1991;933.
20. Granqvist C.G. Appl. Phys. A. 57:1993;3.
21. Crandall R.S., Faughnan B.W. Appl. Phys. Lett. 28:1976;95.