Contribution for the optimization of the vapor phase decomposition technique

Materials Science and Engineering: B

Volumn 102, Issue 1-3, 2003, Pages 213-217

  Danel, A ^a   Lardin, T ^a   Giroud, C ^a   Tardif, F ^a  

^a CEA GRENOBLE   (France)

Author keywords

Metallic contamination; Silicon wafer; Vapour phase decomposition

Indexed keywords

CONTAMINATION; DECOMPOSITION; FLUORESCENCE; INDUCTIVELY COUPLED PLASMA; SPECTROMETRY; VAPORIZATION; X RAYS;

VAPOR PHASE DECOMPOSITION;

SILICON WAFERS;

EID: 0042012717     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0921-5107(02)00713-4     Document Type: Conference Paper

References (7)

1. Shimazaki A., Hiratsuka H., Matsushita Y., Yoshii S. Solid State Devices Mater. 1984;281.
2. Neumann C., Eichinger P. Spectrochem. Acta. 46B:1991;1369.
3. Loewenstein L.M., et al. J. Electrochem. Soc. 146:1999;719-727.
4. Morinaga H. IEICE, Trans. Electron. E79-C:1996;343-362.
5. G. Mainka, et al., in: M. Heyns (Ed.), Proceedings of the UCPSS'96, 1996, pp. 41-44.
6. I. Rink, R. Girisch, in: M. Heyns (Ed.), Proceedings of the UCPSS'96, 1996, pp. 45-48.
7. De Gendt S., et al. Solid State Phenom. 65-66:1999;93-96.