Plasma Process Technology for Micromechanic Measuring Structures;Plasmaprozess-Technologie für mikromechanische Messobjekte

Technisches Messen

Volumn 68, Issue 2, 2001, Pages 57-60

  Dehoff, Arnulf ^a   Reetz, Martin ^a   Wandel, Klaus ^a   Wolf, Rainer ^b  

^a SENTECH INSTRUMENTS GMBH   (Germany)

^b Opto Transmitter U   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

3D INSPECTION; ION BEAM ETCHING; LOW-TEMPERATURE SILICONS; MICRO BEAMS; PLASMA PROCESS; TEST STRUCTURE;

INSTRUMENTS; MEASUREMENTS;

PLASMAS;

EID: 0041970952     PISSN: 01718096     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (6)

1. Beumler, K.; Osten, W.: F&M, 108 (2000) 9, S. 66-68.
2. Vogel, D., Sommer, J. P.: tm 2/2001.
3. Dost, M.: tm 2/2001.
4. Avon, A. A., Braff, R., Lin, C. C., Sawin, H. H., Schmidt, M. A.: Journal of the Electrochemical Society 146 (1999) 1, S. 339-349.
5. Wolf, R., Gruska, B.; Wandel, K.: MicroMat 2000, Berlin, 17.-19. April 2000; Abstract: ISBN 3-932434-14-5, S. 424.
6. Jüptner, W.; Kujawinska, M.; Osten, W.; Salbut, S.; Seebacher, S.: Proc. SPIE Vol. 3407 (1998), S. 348-357.