Annealing of quench-condensed noble gas films

Physica B: Condensed Matter

Volumn 284-288, Issue PART I, 2000, Pages 381-382

  Metcalf, Thomas H ^a   Pohl, R O ^a  

^a Laboratory of Atomic and Solid State Physics and Sibley School of Mechanical and Aerospace Engineering   (United States)

Author keywords

Annealing; Rare gas solids; Solid neon; Thin films

Indexed keywords

ANNEALING; INTERNAL FRICTION; PLASTIC DEFORMATION; PRESSURE MEASUREMENT; THIN FILMS; VAPOR PRESSURE;

QUENCH CONDENSATION;

INERT GASES;

EID: 0033704732     PISSN: 09214526     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0921-4526(99)02770-2     Document Type: Article

References (2)

1. B.E. White Jr., J. Hessinger, R.O. Pohl, J. Low Temp. Phys. 111 (1998) 233.
2. Xiao Liu, R.O. Pohl, R.S. Crandall, in: H.M. Branz, R.W. Collins, H. Okamoto, S. Guha, R. Schropp, (Eds.), Amorphous and Heterogeneous Silicon Thin Films: Fundamentals to Devices - 1999, Mat. Res. Soc. Symp. Proc. 557 (1999).