High-repetition rate excimer laser for micromachining

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4971, Issue , 2003, Pages 87-95

  Herbst, Ludolf ^a   Klaft, Ingo ^a   Wenzel, Thomas ^a   Rebhan, Ulrich ^a  

^a Lambda Physik GmbH   (Germany)

Author keywords

High repetition rate excimer laser; Micro structuring; UV light

Indexed keywords

LASER ABLATION; LITHOGRAPHY; MICROMACHINING; MICROSTRUCTURE; PRECISION ENGINEERING; ULTRAVIOLET RADIATION;

HIGH ENERGY MICROMACHINING; HIGH REPETITION RATE EXCIMER LASER; PRECISION MICROSTRUCTURING;

EXCIMER LASERS;

EID: 0041825790     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.479174     Document Type: Conference Paper

References (3)

1. D. Basting et al, "Excimer Laser Technology: laser sources, optics, systems and applications", Lambda Physik AG, pp 95ff, 2001
2. Frank Meyer et al, "Micro-structuring of Photo Resists by UV Laser Radiation", ICALEO 2002, P510
3. Thomas Kuntze et al, "Laser Marking of Materials by Micro-Mirror-Arrays", ICALEO 2002, P525