Laser micromachining of optical materials with a 157 nm fluorine laser

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4941, Issue , 2002, Pages 77-83

  Greuters, Jako ^a   Rizvi, Nadeem H ^a  

^a Exitech Ltd   (United Kingdom)

Author keywords

157 nm laser; F2 laser micromachining; Indium phosphide; Lithium niobate; Photonics devices; Silica

Indexed keywords

GAS LASERS; MICROMACHINING; MICROSTRUCTURE; OPTICAL MATERIALS;

LASER MICROMACHINING;

LASER BEAM EFFECTS;

EID: 0041728864     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.468234     Document Type: Conference Paper

References (6)

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2. 2-lasers: high resolution micromachining system for shaping photonics components", Conf. on Lasers and Electro-Optics, Tech. Digest (OSA, Wash. DC 2001) p574-577
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4. J. Greuters and N. H. Rizvi "UV laser micromachining of silicon, indium phosphide and lithium niobate for telecommunications applications", Proceedings of SPIE, Opto Ireland Conference, Sep 5-6 2002, Galway, Ireland (to be published).
5. S. Winnall, S. Winterbaum, "Lithium niobate reactive ion etching", http://dsto.hearne.com.au/cgi-bin/extract.pl?DSTO-TN-0291.
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