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Volumn 43, Issue 9-11, 2003, Pages 1455-1460

Effects of burn-in stressing on post-irradiation annealing response of power VDMOSFETs

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; COMMUNICATION SATELLITES; ELECTRIC BREAKDOWN; LEAKAGE CURRENTS; RADIATION EFFECTS; STRESS ANALYSIS; THRESHOLD VOLTAGE;

EID: 0041692616     PISSN: 00262714     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0026-2714(03)00258-0     Document Type: Conference Paper
Times cited : (11)

References (12)
  • 1
    • 0033874343 scopus 로고    scopus 로고
    • An overview of radiation effects on electronics in the space telecommunications environment
    • Fleetwood DM, Winokur PS, Dodd PE. An overview of radiation effects on electronics in the space telecommunications environment. Microelectron. Reliab. 2000; 40:17-26.
    • (2000) Microelectron. Reliab. , vol.40 , pp. 17-26
    • Fleetwood, D.M.1    Winokur, P.S.2    Dodd, P.E.3
  • 2
    • 0025405045 scopus 로고
    • MOS device degradation due to total dose ionizing radiation in the natural space environment: A review
    • Galloway KF, Schrimpf RD. MOS device degradation due to total dose ionizing radiation in the natural space environment: a review. Microelectronics J. 1990: 21:67-81.
    • (1990) Microelectronics J. , vol.21 , pp. 67-81
    • Galloway, K.F.1    Schrimpf, R.D.2
  • 4
    • 0003499333 scopus 로고
    • Selector Guide. Cross Reference and Reliability Data, Motorola Inc.
    • TMOS Power MOSFET, Selector Guide. Cross Reference and Reliability Data, Motorola Inc., 1985.
    • (1985) TMOS Power MOSFET
  • 7
    • 0041466223 scopus 로고    scopus 로고
    • Analysis of post-irradiation annealing of n-channel power vertical double-diffused metal-oxide-semiconductor transistors
    • Ristic G, Pejovic M, Jaksic A. Analysis of post-irradiation annealing of n-channel power vertical double-diffused metal-oxide-semiconductor transistors. J. Appl. Phys. 2000; 87:1-10.
    • (2000) J. Appl. Phys. , vol.87 , pp. 1-10
    • Ristic, G.1    Pejovic, M.2    Jaksic, A.3
  • 10
    • 0022600166 scopus 로고
    • Simple technique for separating the effects of interface traps and trapped-oxide charge in metal-oxide-semiconductor transistors
    • McWhorter PJ, Winokur PS. Simple technique for separating the effects of interface traps and trapped-oxide charge in metal-oxide-semiconductor transistors. Appl. Phys. Lett. 1986: 48:133-135.
    • (1986) Appl. Phys. Lett. , vol.48 , pp. 133-135
    • McWhorter, P.J.1    Winokur, P.S.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.