Effect of ion impinging on the microstructure and field emission of carbon nanotubes

Solid State Communications

Volumn 127, Issue 4, 2003, Pages 289-293

  Zhang, Jihua ^a   Wang, Xi ^a   Yu, Weidong ^a   Feng, Tao ^a   Zhang, Fumin ^a   Zheng, Zhihong ^a   Li, Qiong ^b   Liu, Xianghuai ^a  

^a SHANGHAI INSTITUTE OF MICROSYSTEM AND INFORMATION TECHNOLOGY   (China)

^b EAST CHINA NORMAL UNIVERSITY   (China)

Author keywords

A. Carbon nanotubes; A. Plasma; C. Microstucture; D. Field emission

Indexed keywords

ELECTRON EMISSION; FLAT PANEL DISPLAYS; MICROSTRUCTURE; PLASMA APPLICATIONS;

ION IMPINGING;

CARBON NANOTUBES;

EID: 0041669607     PISSN: 00381098     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0038-1098(03)00429-0     Document Type: Article

References (14)

1. Rinzler A.G., Hafner J.H., Nikolaev P., Lou L., Kim S.G., Tomanek D., Nordlander P., Colbert D.T., Smalley R.E. Science. 269:1995;1550.
2. Chung D.S., Park S.H., Lee H.W., Choi J.H., Cha S.N., Kim J.W., Jang J.E., Min K.W. Appl. Phys. Lett. 80:2002;4045.
3. Chung D.S., Choi W.B., Kang J.H., Kim H.Y., Han I.T., Park Y.S., Lee Y.H., Lee N.S., Jung J.E., Kim J.M., Kim J.M. J. Vac. Sci. Technol., B. 18:2000;1054.
4. Choi W.B., Lee Y.H., Lee N.S., Kang J.H., Park S.H., Kim H.Y., Chung D.S., Lee S.M., Chung S.Y., Kim J.M. Jpn. J. Appl. Phys. Part 1. 39:2000;2560.
5. Jung J.E., Jin Y.W., Choi J.H., Park Y.J., Ko T.Y., Chung D.S., Kim J.W., Jang J.E., Cha S.N., Yi W.K., Cho S.H., Yoon M.J., Lee C.G., You J.H., Lee N.S., Yoo J.B., Kim J.M. Physica B. 323:2002;71.
6. Han S., Ihm J. Phys. Rev. B. 61:2000;9986.
7. Chen Y., Shaw D.T., Guo L. Appl. Phys. Lett. 76:2000;2469.
8. J. Zhang, T. Feng, W. Yu, X. Liu, X. Wang, Q. Li, Diamond Relat. Mater., submitted for publication.
9. Kwo J.L., Yokoyama M., Wang W.C., Chuang F.Y., Lin I.N. Diamond Relat. Mater. 9:2000;1270.
10. Zhi C.Y., Bai X.D., Wang E.G. Appl. Phys. Lett. 81:2002;1690.
11. Kung S.C., Hwang K.C. Appl. Phys. Lett. 80:2002;4819.
12. Liang Q., Gao L.Z., Li Q., Tang S.H., Liu B.C., Yu Z.L. Carbon. 39:2001;897.
13. Sung S.L., Tsai S.H., Tseng C.H., Chiang F.K., Liu X.W., Shih H.C. Appl. Phys. Lett. 74:1999;197.
14. Li Q., Xu J.F., Feng F., Wang X., Liu X.H. Chin. Phys. Lett. 19:2002;1021.