Magnetic properties of Ni1-x-yCoxFey films deposited by polyol electroless process

Materials Letters

Volumn 57, Issue 24-25, 2003, Pages 4098-4107

  Vemagiri, J K ^a   Murthy, S K ^a   Gunasekaran, R A ^a   Coane, P ^a   Varahramyan, K ^a  

^a LOUISIANA TECH UNIVERSITY   (United States)

Author keywords

Crystal structure; Electron microscopy; Magnetic materials; NiCoFe alloy; Polyol process; Thin films

Indexed keywords

COBALT ALLOYS; CRYSTAL STRUCTURE; ELECTROLESS PLATING; ELECTRON MICROSCOPY; INTERFEROMETRY; IRON ALLOYS; MORPHOLOGY; NICKEL ALLOYS; SOFT MAGNETIC MATERIALS; SURFACE ROUGHNESS; X RAY DIFFRACTION ANALYSIS;

POLYOL PROCESS;

TERNARY SYSTEMS;

EID: 0041659231     PISSN: 0167577X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-577X(03)00274-X     Document Type: Article

References (43)

1. Löchel B., Maciossek A. J. Electrochem. Soc. 143:1996;3343.
2. Brenner A. Electrodeposition of Alloys. vol. 2:1963;Academic Press, New York.
3. Gömez E., Ram̀rez J., Vallés E. J. Appl. Electrochem. 28:1998;71.
4. Gömez E., Vallés E. J. Appl. Electrochem. 29:1999;805.
5. Liao S.H. IEEE Trans. Magn. Mag.-23:1987;2981.
6. Shinoura O., Kamijama K. Jpn. J. Surf. Fin. 44:1993;1114.
7. Osaka T., Homma T., Masubuchi N., Saito K., Yoshino M., Yamazaki Y., Namikawa T. J. Magn. Soc. Jpn. 14:1990;309.
8. Osaka T., Homma T., Saito K., Takekoshi A., Yamazaki Y., Namikawa T. J. Electrochem. Soc. 139:1992;1311.
9. Takano O., Ishibashi S. Jpn. J. Met. Fin. 18:1967;46.
10. Takano O., Matsuda H. Met. Fin. 83(5):1985;63.
11. Takano O., Matsuda H. Jpn. J. Met. Fin. 31:1980;146.
12. Goto F., Suganuma Y., Osaka T. Jpn. J. Met. Fin. 33:1982;14.
13. Suganuma Y., Tanaka H., Yanagisawa M., Goto F., Hatano S. IEEE Trans. Magn. Mag.-18:1982;1215.
14. Osaka T., Homma T., Masubuchi N., Saito K., Yoshino M., Yamazaki Y., Namikawa T. J. Magn. Soc. Jpn. 14:1990;309.
15. Osaka T., Homma T., Kageyama K., Matsunae Y. Denku. Kagaku. 62:1994;987.
16. Osaka T., Homma T., Kageyama K., Matsunae Y., Shinoura O. J. Magn. Soc. Jpn. 18-S1:1994;183.
17. Homma T., Inoue K., Asai H., Ohrui K., Osaka T. IEEE Trans. Magn. 27(6):1991;4909.
18. Heritage R.T., Walker M.T. J. Electron. Control. 1960;7.
19. Kim D., Aoki K., Takano O. J. Electrochem. Soc. 142(11):1995;3763.
20. Crangle J. Solid State Magnetism. 1991;195 Edward Arnold, London.
21. Alben R., Becker J.J., Chi M.C. J. Appl. Phys. 49:1978;1653.
22. Chudnovsky E.M., Saslow W.M., Serota R.A. Phys. Rev., B. 33:1986;251.
23. Herzer G. IEEE Trans. Magn. 26:1990;1397.
24. Herzer G. Hernando A. Nanomagnetism. 1993;111 Kluwer Academic Publishing, Dordrecht.
25. Andricacos P.C., Robertson N. IBM J. Res. Develop. 42(5):1998;671.
26. Hartman U. Magnetic Multilayers and Gaint Magnetoresistance: Fundamentals and Industrial Applications. 1999;Springer, Berlin.
27. Zhang J., Chow G.M., Lawrence S.H., Feng C.R. Mater. Phys. Mech. (1):2000;11.
28. Chow G.M., Zhang J., Li Y.Y., Ding J., Goh W.C. Mater. Sci. Eng., A. 304-306:2001;194.
29. Brandow S.L., Dressick W.J., Marrian C.R.K., Chow G.M., Calvert J.M. J. Electrochem. Soc. 142:1995;2233.
30. Chow G.M., Kurihara L.K., Ma D., Feng C.R., Schoen P.E., Martinez-Miranda L.J. Appl. Phys. Lett. 70:1997;2315.
31. Chow G.M., Stockton W.B., Price R., Baral S., Ratna B., Schnur J.M., Bergeron G.L., Czarnaski M.A., Hickman J.J., Kirkpatrick D.A. Mater. Sci. Eng., A. 158:1992;1.
32. Chow S.L., Hedgecock N.E., Schlesinger M. J. Electrochem. Soc. 119:1972;1614.
33. Chesnutt R. J. Appl. Phys. 73:1993;6223.
34. Bruss D.B., Veies T.D. J. Am. Chem. Soc. 78:1956;733.
35. Viau G., Fievet-Vincent F., Fievet F. J. Mater. Chem. 6:1996;1047.
36. Viau G., Fievet-Vincent F., Fievet F. Solid State Ionics. 84:1996;259.
37. Osaka T. Electrochim. Acta. 42:1997;3015.
38. Takai M., Hayashi K., Aoyagi M., Osaka T. J. Electrochem. Soc. 144:1997;L203.
39. Osaka T., Takai M., Hayashi K., Ohashi K., Saito M., Yamada K. Nature. 392:1998;796.
40. Phan N.H., Schwartz M., Nobe K. J. Appl. Electrochem. 21:1991;672.
41. Fievet F. Surfactant Sci. Ser. 92:2000;460.
42. Chow G.M., Ding J., Zhang J., Lee K.Y., Surani D., Lawrence S.H. Appl. Phys. Lett. 74:1999;1889.
43. Chow G.M., Li Y.Y., Hwu Y.K. Mater. Phys. Mech. 1:2000;67.