Variants of the LIGA technology for the production of plastic microcomponents

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4945, Issue , 2002, Pages 112-121

  Singleton, Laurence ^a   Detemple, Peter ^a   Löwe, Holger ^a  

^a INSTITUT FÜR MIKROTECHNIK MAINZ GMBH   (Germany)

Author keywords

Deep X ray lithography; DXRL; LIGA; Moulding; Optical components; PMMA; Waveguides

Indexed keywords

ELECTROFORMING; ELECTROPLATING; SYNCHROTRON RADIATION; WAVEGUIDES; X RAY LITHOGRAPHY;

DEEP X RAY LITHOGRAPHY; HOT EMBOSSING; OPTICAL COMPONENTS;

PLASTICS MOLDING;

EID: 0041561188     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.468413     Document Type: Conference Paper

References (6)

1. G. Feiertag, "Microfabrication with Deep X-ray Lithography: Accuracy of the Pattern Transfer and Microstructuring with Tilted Irradiations", VDI Fortschrittberichte, Series 9, Number 242, VDI Verlag (In German).
2. G. Feiertag, W. Ehrfeld, H. Lehr, M. Schmidt, A. Schmidt, "Calculation and determination of structure transfer accuracy in deep X-ray lithography", Journal of Micromechanics and Microengineering, (7), 1997, 323-331
3. L. Singleton, A. Bogdanov, S. Peredkov, O. Wilhelmi, A. Schneider, Andreas; C. Cremers; S. Megtert, A. Schmidt, "Deep X-ray lithography with the SU-8 resist", Proc SPIE 4343, p 182, 2001.
4. A. Bogdanov and S. Peredkov, "Use of SU-8 photoresist for very high aspect ratio X-ray lithography"
5. C. Cremers, F. Bouramrane; L. Singleton, A. Schmidt, "SU-8 as resist material for deep X-ray lithography", Microsystem Technologies, 7 (2001) 11-16
6. L. Singleton; R. Schenk, O. Haverbeck, A. Tunayer, A. Himmelsbach, C. Krempel, P. Detemple, M. Lacher, "Design of experiments optimization of PMMA for LIGA applications" Proc SPIE 4690, p. 1180, 2002