메뉴 건너뛰기




Volumn 4690 II, Issue , 2002, Pages 1180-1187

Design of experiments optimization of PMMA for LIGA applications

Author keywords

Deep X ray Lithography; Design of Experiments; DXRL; LIGA; PMMA

Indexed keywords

COMPOSITION; CRACK INITIATION; CROSSLINKING; ELECTROPLATING; INJECTION MOLDING; IRRADIATION; MASKS; MICROSTRUCTURE; OPTIMIZATION; RESIDUAL STRESSES; SCANNING ELECTRON MICROSCOPY; SYNCHROTRON RADIATION; X RAY LITHOGRAPHY;

EID: 0036030136     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.474195     Document Type: Conference Paper
Times cited : (6)

References (6)
  • 1
    • 0034325654 scopus 로고    scopus 로고
    • Polymer waveguide devices with passive pigtailing: An application of LIGA technology
    • H.-D. Batter, W. Ehrfeld, M. Harder, "Polymer waveguide devices with passive pigtailing: an application of LIGA technology", Synthetic Metals, (115), 2000, 13-20.
    • (2000) Synthetic Metals , Issue.115 , pp. 13-20
    • Batter, H.-D.1    Ehrfeld, W.2    Harder, M.3
  • 2
    • 0028543109 scopus 로고
    • Advanced microstrucure products by synchrotron radiation lithography
    • Proceedings of the European Symposium on Frontiers in Science and Technology with Synchrotron Radiation
    • H. Lehr, W. Ehrfeld, "Advanced microstrucure products by synchrotron radiation lithography", Proceedings of the European Symposium on Frontiers in Science and Technology with Synchrotron Radiation, Journal de Physique, 4, C9, 1994, 229-236.
    • (1994) Journal de Physique , vol.4 , Issue.C9 , pp. 229-236
    • Lehr, H.1    Ehrfeld, W.2
  • 4
    • 0029732931 scopus 로고    scopus 로고
    • Aligned double exposures in deep X-ray lithography
    • No. 1
    • A. Schmidt, W. Ehrfeld, H. Lehr, "Aligned Double Exposures in Deep X-ray Lithography", Microelectronic Engineering, (30), No. 1, 1996, 235-238.
    • (1996) Microelectronic Engineering , Issue.30 , pp. 235-238
    • Schmidt, A.1    Ehrfeld, W.2    Lehr, H.3
  • 6
    • 0001725324 scopus 로고
    • Requirements on resist layers in deep etch synchrotron radiation lithography
    • J. Mohr, W. Ehrfeld, D. Munchmeyer, "Requirements on resist layers in deep etch synchrotron radiation lithography", Journal of Vacuum Science B 6(6) 1988, 2264-2267.
    • (1988) Journal of Vacuum Science B , vol.6 , Issue.6 , pp. 2264-2267
    • Mohr, J.1    Ehrfeld, W.2    Munchmeyer, D.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.