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Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 21, Issue 4, 2003, Pages 1414-1418

Influence of working gas pressure on structure and properties of WO3 films reactively deposited by rf magnetron sputtering

(4) Takahashi, T a Tanabe, J a Yamada, N a Nakabayashi, H a

a UNIVERSITY OF TOYAMA (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTALLIZATION; FILM PREPARATION; GLASS; GRAIN SIZE AND SHAPE; MAGNETRON SPUTTERING; MIXTURES; MORPHOLOGY; OPTICAL PROPERTIES; OPTICAL VARIABLES MEASUREMENT; PLASMA DENSITY; SPUTTER DEPOSITION; X RAY DIFFRACTION ANALYSIS;

CRYSTALLINITY; GLASS SLIDE SUBSTRATES; PLASMA EMISSION; WORKING GAS PRESSURE;

TUNGSTEN COMPOUNDS;

EID: 0041528493 PISSN: 07342101 EISSN: None Source Type: Journal
DOI: 10.1116/1.1575216 Document Type: Article

Times cited : (6)

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