Electron transport properties in magnetic tunnel junctions with epitaxial NiFe (111) ferromagnetic bottom electrodes

Applied Physics Letters

Volumn 82, Issue 26, 2003, Pages 4735-4737

  Yu, Ji Hyung ^a   Lee, Hyuck Mo ^a   Ando, Yasuo ^b   Miyazaki, Terunobu ^b  

^a Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

^b TOHOKU UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL DEFECTS; ELECTRON SPECTROSCOPY; ELECTRON TRANSPORT PROPERTIES; FERROMAGNETIC MATERIALS; INTERFACES (MATERIALS); MAGNETORESISTANCE; NICKEL COMPOUNDS; SURFACE ROUGHNESS;

BOTTOM ELECTRODES;

TUNNEL JUNCTIONS;

EID: 0041345810     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1587271     Document Type: Article

References (13)

1. S. Yuasa, T. Sato, E. Tamura, Y. Suzuki, H. Yamamori, K. Ando, and T. Katayama, Europhys. Lett. 52, 344 (2000).
2. M. Bowen, V. Cros, F. Petroff, A. Fert, C. Martínez Boubeta, J. L. Costa-Krämer, J. V. Anguita, A. Cebollada, F. Briones, J. M. de Teresa, L. Morellón, M. R. Ibarra, F. Güell, F. Peiró, and A. Cornet, Appl. Phys. Lett. 79, 1655 (2001).
3. J. H. Yu, M. Hayashi, M. Oogane, T. Daibou, H. Nakamura, H. Kubota, Y. Ando, T. Miyazaki, and H. M. Lee, J. Appl. Phys. 93, 8555 (2003).
4. H. Gong, M. Rao, D. N. Laughlin, and D. N. Lambeth, J. Appl. Phys. 85, 5750 (1999).
5. S. Zhang and P. M. Levy, Phys. Rev. Lett. 79, 3744 (1997).
6. Y. Lu, X. W. Li, G. Xiao, R. A. Altman, W. J. Gallagher, A. Marley, K. Roche, and S. Parkin, J. Appl. Phys. 83, 6515 (1998).
7. J. S. Moodera, J. Nowak, and R. J. M. Veerdonk, Phys. Rev. Lett. 80, 2941 (1998).
8. Y. Ando, J. Murai, H. Kubota, and T. Miyazaki, J. Appl. Phys. 87, 5209 (2000).
9. J. Murai, Y. Ando, T. Daibou, K. Yaoita, H. F. Han, and T. Miyazaki, J. Magn. Magn. Mater. 226-230, 922 (2001).
10. P. LeClair, J. T. Kohlhepp, C. H. van de Vin, H. Wieldraaijer, H. J. M. Swagten, W. J. M. de Jonge, A. H. Davis, J. M. MacLaren, J. S. Moodera, and R. Jansen, Phys. Rev. Lett. 88, 107201 (2002).
11. H. Matsumoto, J. Rogers, H. Umezawa, and M. Tachiki, J. Magn. Magn. Mater. 20, 11 (1980).
12. J. Zhang and R. M. White, J. Appl. Phys. 83, 6512 (1998).
13. Y. Li, S. X. Wang, G. Khanna, and B. M. Clemens, Thin Solid Films 381, 160 (2001).