Nanolithography using molecular optics

Journal of Applied Physics

Volumn 94, Issue 1, 2003, Pages 669-676

  Gordon, Robert J ^a   Zhu, Langchi ^a   Andreas Schroeder, W ^a   Seideman, Tamar ^b  

^a UNIVERSITY OF ILLINOIS AT CHICAGO   (United States)

^b NORTHWESTERN UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ABERRATIONS; CONTINUOUS WAVE LASERS; LASER BEAMS; LENSES; MOLECULAR BEAMS; PROBABILITY;

CHROMATIC ABERRATION;

NANOTECHNOLOGY;

EID: 0041339840     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1578173     Document Type: Article

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