Thermal distortion of an X-ray mask for synchrotron radiation lithography

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 37, Issue 12 B, 1998, Pages 6804-6807

  Yang, Jinfeng ^a   Toyota, Eijiro ^a   Kawachi, Shunichi ^a  

^a SUMITOMO HEAVY INDUSTRIES LTD   (Japan)

Author keywords

Scanning exposure; Synchrotron radiation lithography; Thermal distortion; X ray mask

Indexed keywords

EID: 0040956252     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.37.6804     Document Type: Article

References (5)

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