메뉴 건너뛰기




Volumn 71, Issue 12, 1997, Pages 1831-1840

Alkylsilanes and alkylcarbosilanes as single-source precursors for the formation of a-Si:C:H thin-film materials by atomic hydrogen-induced chemical vapour deposition

Author keywords

Alkylcarbosilanes; Alkylsilanes; Atomic hydrogen; Chemical vapour deposition; Thin films

Indexed keywords


EID: 0040687246     PISSN: 01375083     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article
Times cited : (6)

References (32)
  • 19
    • 0003875090 scopus 로고
    • Academic Press, Orlando, FL Chapter 6
    • Yasuda H., Plasma Polymerization, Academic Press, Orlando, FL (1985), Chapter 6, pp 169-171.
    • (1985) Plasma Polymerization , pp. 169-171
    • Yasuda, H.1
  • 30
    • 0003758983 scopus 로고
    • Springer-Verlag, Berlin, Chapter 2
    • Fritz G. and Matern E., Carbosilanes, Springer-Verlag, Berlin, 1986, Chapter 2.
    • (1986) Carbosilanes
    • Fritz, G.1    Matern, E.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.