Alkylsilanes and alkylcarbosilanes as single-source precursors for the formation of a-Si:C:H thin-film materials by atomic hydrogen-induced chemical vapour deposition

Polish Journal of Chemistry

Volumn 71, Issue 12, 1997, Pages 1831-1840

  Walkiewicz Pietrzykowska, A ^a   Wrobel A M ^a   Kryszewski, M ^a  

^a CENTRE OF MOLECULAR AND MACROMOLECULAR STUDIES   (Poland)

Author keywords

Alkylcarbosilanes; Alkylsilanes; Atomic hydrogen; Chemical vapour deposition; Thin films

Indexed keywords

EID: 0040687246     PISSN: 01375083     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (32)

1. Sussmann R. S. and Ogden R., Phil. Mag., 44, 137 (1981).
2. Smith G. B. and McKenzie D. R., J. Appl. Phys., 65, 1694 (1989).
3. Choi W. K., Loo F. L., Loh F. C. and Tien K. L., J. Appl. Phys., 80, 1611 (1996).
4. Choi W. K., Loo F. L., Ling C. H., Loh F. C. and Tan K. L., J. Appl. Phys., 78, 7289 (1995).
5. Bayley P. A. and Marshall J. M., Phil. Mag., B73, 429 (1996).
6. Loboda M. J. and Ferber M. K., J. Mat. Res., 8, 2908 (1993).
7. Wróbel A. M., Wickramanayaka S. and Hatanaka Y., J. Appl. Phys., 76, 558 (1994).
8. Wróbel A. M., Wickramanayaka S., Nakanishi Y., Hatanaka Y. and Wysiecki M., J. Chem. Vap. Deposition, 2, 229 (1994).
9. Wickramanayaka S., Hatanaka Y. Nakanishi Y. and Wróbel A. M., J. Electrochem. Soc., 141, 2910 (1994).
10. Wróbel A. M., Wickramanayaka S., Nakanishi Y., Fukuda Y. and Hatanaka Y., Chem. Mat., 7, 1403 (1995).
11. Wróbel A.M., Wickramanayaka S., Nakanishi Y. and Hatanaka Y., J. Mat. Process. Technol., 53, 477 (1995).
12. Wróbel A. M., Walkiewicz-Pietrzykowska A., Stasiak M., Aoki T., Hatanaka Y. and Szumilewicz J., J. Electrochem. Soc., in press.
13. O'Neal H.E. and Ring M. A., J. Organomet. Chem., 213, 419 (1981).
14. Wróbel A. M. and Wertheimer M. R., In Plasma Deposition, Treatment, and Etching of Polymers,. d'Agostino R., Editor, Academic Press, Boston, MA (1990), Chapter 3.
15. Wróbel A. M. and Stańczyk W., Chem. Mat., 6, 1766 (1994).
16. Wróbel A. M. and Walkiewicz-Pietrzykowska A., J. Chem. Vap. Deposition, 4, 87 (1995).
17. Yasui K., Fujita A. and Akahane T., Jpn. J. Appl. Phys., 31, L379 (1992).
18. Yasui K., Muramoto M. and Akahane T., Jpn. J. Appl. Phys., 33, 4395 (1994).
19. Yasuda H., Plasma Polymerization, Academic Press, Orlando, FL (1985), Chapter 6, pp 169-171.
20. Sharma A. K., J. Polym. Sci., Part A, Polym. Chem. Ed., 24, 3077 (1986).
21. Wróbel A. M., Kryszewski M. and Czeremuszkin G., Thin Solid Films, 289, 112 (1996).
22. Fabry L., Potzinger P., Reimann B., Ritter A. and Steenbergen H.P., Organometallics, 5, 1231 (1986).
23. Doobs K. D. and Doren D. J., J. Am. Chem. Soc., 115, 3731 (1993).
24. Jones W. E., Macknight S. D. and Teng L., Chem. Rev., 73, 407 (1973).
25. Ellul R., Potzinger P. and Reiman B., J. Phys. Chem., 88, 2793 (1984).
26. Tokach K. and Koob R. D., J. Phys. Chem., 83, 774 (1979).
27. Tokach S. K. and Koob R. D., J. Am. Chem. Soc., 102, 376 (1980).
28. Walkiewicz-Pietrzykowska A. and Wróbel A. M., unpublished results.
29. Raabe G. and Michl J., Chem. Rev., 85, 419 (1985).
30. Fritz G. and Matern E., Carbosilanes, Springer-Verlag, Berlin, 1986, Chapter 2.
31. Yoshida A., Inoue K., Ohashi H. and Saito Y., Appl. Phys. Lett., 57, 484 (1990).
32. Wróbel A. M. and Kryszewski M., Progr. Colloid Polym. Sci., 85, 91 (1991).