메뉴 건너뛰기




Volumn 41, Issue 1, 1998, Pages 25-30

Simulation of structural characteristics of ceramic coating film based on modeling of sputtering process

Author keywords

Ceramic Coating; Dynamics of Rigid Spheres; Microhardness; Modeling; Monte Carlo Simulation; Numerical Analysis; Sputtering

Indexed keywords

AMORPHOUS FILMS; COMPUTER SIMULATION; HARDNESS; MATHEMATICAL MODELS; MONTE CARLO METHODS; PARTICLES (PARTICULATE MATTER); SPUTTER DEPOSITION; STRUCTURE (COMPOSITION); VOLUME FRACTION;

EID: 0031695939     PISSN: 13447912     EISSN: None     Source Type: Journal    
DOI: 10.1299/jsmea.41.25     Document Type: Article
Times cited : (2)

References (19)
  • 1
    • 0015356536 scopus 로고
    • Structures and Resistive Properties of Sputtered Ti-Zr-Al-N Thin Film
    • Wasa, K. and Hayakawa, S., Structures and Resistive Properties of Sputtered Ti-Zr-Al-N Thin Film, Thin Solid Film, Vol. 10 (1972), p. 367.
    • (1972) Thin Solid Film , vol.10 , pp. 367
    • Wasa, K.1    Hayakawa, S.2
  • 3
    • 0347609683 scopus 로고
    • Highly Oriented ZnO Films by RF Sputtering of Hemispherical Electrode System
    • Ohji, K., Tohda, T., Wasa, K. and Hayakawa, S., Highly Oriented ZnO Films by RF Sputtering of Hemispherical Electrode System, J. Appl. Phys., Vol. 47, No. 4 (1976), p. 1726.
    • (1976) J. Appl. Phys. , vol.47 , Issue.4 , pp. 1726
    • Ohji, K.1    Tohda, T.2    Wasa, K.3    Hayakawa, S.4
  • 5
    • 0038657051 scopus 로고
    • Preparation of Conducting and Transparent Thin Films of Tin-Doped Indium Oxide by Magnetron Sputtering
    • Buchanan, M., Webb, J.B. and Wiliams, D.F., Preparation of Conducting and Transparent Thin Films of Tin-Doped Indium Oxide by Magnetron Sputtering, Appl. Phys. Lett, Vol. 37, No. 2 (1980), p. 213.
    • (1980) Appl. Phys. Lett , vol.37 , Issue.2 , pp. 213
    • Buchanan, M.1    Webb, J.B.2    Wiliams, D.F.3
  • 6
    • 84996274060 scopus 로고
    • Analysis of Temperature and Stress fields during Ceramic Coating Process by Detonation Method
    • Hoshide, T., Kumagai, K. and Inoue, T., Analysis of Temperature and Stress fields during Ceramic Coating Process by Detonation Method, Trans. Jpn Soc. Mech. Eng., (in Japanese), Vol. 58, No. 554, A (1992), p. 1869. 4
    • (1992) Trans. Jpn Soc. Mech. Eng., (in Japanese) , vol.58 , Issue.554 A
    • Hoshide, T.1    Kumagai, K.2    Inoue, T.3
  • 8
    • 0000735585 scopus 로고
    • Molecular-Dynamics Simulation of Amorphous Germanium
    • Ding, K. and Andersen, C., Molecular-Dynamics Simulation of Amorphous Germanium, Phys. Rev. B, Vol. 34, No. 10 (1986), p. 6987.
    • (1986) Phys. Rev. B , vol.34 , Issue.10 , pp. 6987
    • Ding, K.1    Andersen, C.2
  • 9
    • 36549102302 scopus 로고
    • Stress and Microstructure of Sputter-Deposited Thin Films : Molecular-Dynamics Investigations
    • Müller,K. H., Stress and Microstructure of Sputter-Deposited Thin Films : Molecular-Dynamics Investigations, J. Appl. Phys., Vol. 62, No. 5 (1987), p. 1796.
    • (1987) J. Appl. Phys. , vol.62 , Issue.5 , pp. 1796
    • Müller, K.H.1
  • 10
    • 0001704259 scopus 로고
    • Molecular-Dynamics Simulation of Cluster and Atom Deposition on Silicon(111)
    • Biswas, R., Grest, G.S. and Soukoulis, C.M., Molecular-Dynamics Simulation of Cluster and Atom Deposition on Silicon(111), Phys. Rev. B, Vol. 38, No. 12 (1988), p. 8154.
    • (1988) Phys. Rev. B , vol.38 , Issue.12 , pp. 8154
    • Biswas, R.1    Grest, G.S.2    Soukoulis, C.M.3
  • 11
    • 0028723062 scopus 로고
    • Molecular-Dynamics Simulation of Sputtering Involving Cluster
    • Shapiro, M.H. and Tombrello, T.A., Molecular-Dynamics Simulation of Sputtering Involving Cluster, Rad. Effects and Defects in Solid, Vol. 130-131 (1994), p. 235.
    • (1994) Rad. Effects and Defects in Solid , vol.130-131 , pp. 235
    • Shapiro, M.H.1    Tombrello, T.A.2
  • 12
    • 0000634645 scopus 로고
    • Low Temperature Growth and Ion-Assisted Deposition
    • Strickland, B. and Roland, C., Low Temperature Growth and Ion-Assisted Deposition, Phys. Rev. B, Vol. 51, No. 8 (1995), p. 5061.
    • (1995) Phys. Rev. B , vol.51 , Issue.8 , pp. 5061
    • Strickland, B.1    Roland, C.2
  • 13
    • 0029735307 scopus 로고    scopus 로고
    • Molecular-Dynamics Studies of Particle Impacts with Carbon-Based Materials
    • Smith, R. and Beardmore, K., Molecular-Dynamics Studies of Particle Impacts with Carbon-Based Materials, Thin Solid Films, Vol. 272, No. 2 (1996), p. 255.
    • (1996) Thin Solid Films , vol.272 , Issue.2 , pp. 255
    • Smith, R.1    Beardmore, K.2
  • 14
    • 0038996699 scopus 로고    scopus 로고
    • Mechanical Properties of Borosilicate Glass Coated with Alumina by Sputtering Process
    • Hoshide, T., Hayashi, K., Saito, T., Katsuki, K. and Inoue, T., Mechanical Properties of Borosilicate Glass Coated with Alumina by Sputtering Process, Mater. Sci. Res. Int., Vol. 2 (1996), p. 33.
    • (1996) Mater. Sci. Res. Int. , vol.2 , pp. 33
    • Hoshide, T.1    Hayashi, K.2    Saito, T.3    Katsuki, K.4    Inoue, T.5
  • 15
    • 85034301624 scopus 로고
    • Private communication
    • Tanaka, K., Private communication, (1992).
    • (1992)
    • Tanaka, K.1
  • 16
    • 0023091864 scopus 로고
    • Assessment of Coating Hardness
    • Burnett, P.J. and Ricerby, D.S., Assessment of Coating Hardness, Surface Eng., Vol. 3 (1987), p. 69.
    • (1987) Surface Eng. , vol.3 , pp. 69
    • Burnett, P.J.1    Ricerby, D.S.2
  • 17
    • 0023397703 scopus 로고
    • Experiences in the Testing of Thin Hard-Material Coatings Using an Ultra-Microhardness Tester
    • Kuhneman, S., Kopacz, U. and Jehn, H., Experiences in the Testing of Thin Hard-Material Coatings Using an Ultra-Microhardness Tester, Prac. Met, Vol. 29 (1987) , p. 382.
    • (1987) Prac. Met , vol.29 , pp. 382
    • Kuhneman, S.1    Kopacz, U.2    Jehn, H.3
  • 19
    • 85034302173 scopus 로고
    • University of Tokyo Press
    • For example, Kinbara, A., Sputtering, (in Japanese), (1989), p. 181, University of Tokyo Press.
    • (1989) Sputtering, (in Japanese) , pp. 181
    • Kinbara, A.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.