Multicusp sources for ion beam projection lithography

Review of Scientific Instruments

Volumn 69, Issue 2 pt 2, 1998, Pages 877-879

  Lee, Y ^a   Gough, R A ^a   Kunkel, W B ^a   Leung, K N ^a   Vujic, J ^a   Williams, M D ^a   Wutte, D ^a   Zahir, N ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON ENERGY LEVELS; ION BEAM LITHOGRAPHY; ION BEAMS; IONS; MAGNETIC FILTERS; PLASMAS;

AXIAL ION ENERGY SPREAD; ION BEAM PROJECTION LITHOGRAPHY; MULTICUSP SOURCES;

ION SOURCES;

EID: 0032000946     PISSN: 00346748     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1148469     Document Type: Article

References (6)