Laser induced plasma spectroscopy. A review of recent advances

Reviews in Analytical Chemistry

Volumn 16, Issue 3, 1997, Pages 173-298

  Schechter, Israel ^a  

^a TECHNION ISRAEL INSTITUTE OF TECHNOLOGY   (Israel)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0040060315     PISSN: 07930135     EISSN: None     Source Type: Journal    
DOI: 10.1515/REVAC.1997.16.3.173     Document Type: Article

References (92)

1. Radziemski, L. J.; Loree, T.R.; Cremers, D.A. and Hoffman, N. M., Anal. Chem. 1983, 55, 1246.
2. Harding-Barlow, I.; Snetsinger, K. G. and Keil, K., Microprobe Analysis, Ed.: Andersen, C.A., Chap 12, p. 423, John Wiley & Sons: New York, 1973.
3. Lewis, A. L.; Beenen, G. J.; Hosch, J. W. and Piepmeier, E. H., Appl. Spectrosc. 1983, 37, 263.
4. Kubota, M., J. Spectrosc. Soc. Jpn. 1971, 20, 241.
5. Moenke-Blankenburg, L., Laser Micro-Analysis; John Wiley & Sons: New York, 1989.
6. Leis, F.; Sdorra, W.; Ko. J. B. and Niemax. K., Microchim. Acta, 1989, II, 85-199.
7. Fernandez, A.; Mao, X.L.; Chan, W.T.; Shannon, M.A. and Russo, R.E., Anal. Chem., 1995, 67, 2444-2450.
8. Omenetto, N.; Petrucci, G.A.; Cavali, P. and Winefordner, J.D., Fresenius J. Anal. Chem. 1996, 355, 878 - 882.
9. Wisbrun, R.; Schechter, I.; Nießner, R.; Schröder, H. and Kompa, K.L., Anal. Chem., 1994, 66, 2964-2975.
10. Schechter, I.; Wisbrun, R.; Nießner, R.; Schröder, H. and Kompa, K.L., Proc. Int. Soc. Opt. Eng. (SPIE), 1994, 2093, 310-321.
11. Schechter, I.; Wisbrun, R.; Nießner, R.; Schröder, H. and Kompa, K.L., Proc. Int. Soc. Opt. Eng. (SPIE), 1994, 2092, 174-185.
12. Joseph, M.R.; Xu, N. and Majidi, V., Spectrochim. Acta, 1994, 49B, 89-103.
13. Nemet, B; Lupkovics, G. and Kozma, L., Proc. Int. Soc. Opt. Eng. (SPIE), 1997, 2778, 703-704.
14. Vadillo, J. M.; Milan, M. and Laserna, J.J., Fresenius J. Anal. Chem., 1996, 355, 10-15.
15. Treytl, W. J.; Marich, K. W. and Glick, D., Anal. Chem., 1975, 47, 1275.
16. Iida, Y., Appl. Spectrosc., 1989, 43, 229.
17. Olesik, J. W. and Hieftje, G. M., Anal. Chem., 1985, 57, 2049.
18. Iida, Y.; Morikawa, H.; Tsuge, A.; Uwamino, Y. and Ishizuka, T., Anal. Sciences 1991, 7, 61-64.
19. Castle, B.C.; Visser, K.; Smith, B.W. and Winefordner, J.D., Appl. Spectrosc., 1997, 51, 1017-1024.
20. Multari, R.A.; Foster, L. E.; Cremers, D.A. and Ferris, M.J., Appl. Spectrosc., 1996, 50, 1483-1499.
21. Treado, P.J.; Levin, I.W. and Lewis, E.N., Appl. Spectrosc., 1992, 46, 1211.
22. Bulatov, V.; Xu, L. and Schechter, I., Anal. Chem., 1996, 68, 2966-2973.
23. Bekefi, G., Ed. Principles of Laser Plasmas; John Wiley & Sons: New York, 1976.
24. Chrisey, D. B.; Hubler, G. K., Eds.; Pulsed Laser Deposition of Thin Films; John Wiley & Sons, New York, 1994.
25. Bulatov, V. and Schechter, I., Submitted.
26. Talmi, Y.; Sieper, H.P. and Moenke-Blankenburg, L., Anal. Chim. Acta, 1981, 127, 71.
27. Vadillo, J. M.; Palanco, S.; Romero, M.D. and Laserna, J.J., Fresenius J. Anal. Chem., 1996, 355, 902-912.
28. Sdorra, W.; Quentmeier, A. and Niemax, K., Mikrochim. Acta, II, 1989, 201-219.
29. Cremers, D. A. and Romero, D.J., Proc. Int. Soc. Opt. Eng.( SPIE), 1986, 644, 1.
30. Wisbrun, R.; Schechter, I.; Niessner, R. and Schröder, H., Proc. Int. Soc. Opt. Eng.( SPIE), 1992, 1716, 2-15.
31. Aguilera, J.A.; Aragon, C. and Campos, J., Appl. Spectrosc, 1992, 46, 1382.
32. Zhao, X.Z.; Shen, L.J.; Lu, X. and Niemax, K., Appl. Phys. B., 1992, 55, 327.
33. Kanicky, V. and Mermet, J.M., Fresenius J. Anal. Chem., 1996, 355, 887-888.
34. Xu, L.; Bulatov, V.; Gridin, V.V. and Schechter, I., Anal. Chem., 1997, 69, 2103-2108.
35. Griem, H. R., Plasma Spectroscopy; McGraw-Hill: New York, 1964.
36. Schröder, H.; Schechter, I.; Wisbrun, R. and Niessner, R., in: Excimer Lasers: The Tools, Fundamentals of their Interaction with Matter, Fields of Applications, Laude, L.D., Ed.; Kluwer Academic Publisher: Dordrecht, the Netherlands, 1994; pp 269-287.
37. Eppler, A.S.; Cremers, D.A.; Hickmott, D.D.; Ferris, M.J. and Koskelo, A.C., Appl. Spectrosc., 1996, 50, 1175-1181.
38. Pichahchy, A. E.; Cremers, D. A. and Ferris, M. J., Spectrochim Acta. B, 1997, 52B, 25-39.
39. Milan, M.; Vadillo, J. M. and Laserna, J. J., J. Anal. At. Spectrom., 1997, 12, 441-444.
40. Treytl, W. J.; Marich, K. W.; Orenberg, J. B.; Carr, P. W.; Miller, D. C. and Glick, D., Anal. Chem., 1971, 43, 1452.
41. Sing, J.P.; Zhang, H.; Yueh, F.-Yu and Carney, K.P., Appl. Spectrosc., 1996, 50, 764-773.
42. Lee, Y.-Ill; Song, K.; Cha, H.-Ki; Lee, J.-Min; Park, M.-Chung; Lee, G.-Hoo and Sneddon, J., Appl. Spectrosc., 1997, 51, 959-964.
43. Ito, Y.; Ueki, O. and Nakamura, S., Anal. Chim. Acta, 1995, 299, 401 -405.
44. Nakamura, S.; Ito, Y.; Sone, K.; Hiraga, H. and Kaneko, K., Anal. Chem., 1996, 68, 2981.
45. Hauer, A. A. and Baldis, H.A. in Laser Induced Plasmas and Applications; Radziemski, L. J. and Cremers, D. A., Eds., Marcel Dekker: New York, 1989, Chap. 3.
46. Russo, R. E., Appl. Spectrosc., 1995, 49, 14A.
47. Ho, W.F.; Ng, C.W. and Cheung, N.H., Appl. Spectrosc., 1997, 51, 87-91.
48. Sappey, A. D. and Nogar, N. S., "Diagnostic Studies of Laser Ablation for Chemical Analysis", in Laser Ablation, Miller, J. C., Ed. Springer: New York 1994.
49. Thomson, D. S. and Murphy, D. M., Appl. Opt. 1993, 32, 6818.
50. Measures, R. M., J. Quant. Spec. Rad. Trans. 1970, 10, 107.
51. Morgan, C.G., IEE Proc.-Sci. Meas. Technol. 1994, 141 ,83-88.
52. Morgan, C.G., Plasma Phys. Control. Fusion, 1984, 26, 1357.
53. Lu, K. T.; Baba, D.; Murray, M. and Xu, F., Am. Environ. Lab., 1997, 9/3, 10-12.
54. Mao, X.L.; Shannon, M.A.; Fernandez, A.J. and Russo, R.E., Appl. Spectrosc., 1995, 49, 1054-1062.
55. Geohegan, D.B., Appl. Phys. Lett., 1993, 62, 1463.
56. Baranov, V. Yu.; Derkach, O. N.; Grishina, V. G.; Kanevskii, M. F. and Sebrant, A. Yu., Phys. Rev. 1993, E48, 1324.
57. Puretzky, A. A.; Geohegan, D. B.; Haufler, R. E.; Hettich, R. L.; Zheng, X. Y. and Compton, R. N., in Laser Ablation: Mechanisms and applications-II, Miller, J. C. and Geohegan, D. B., Eds.; AIP Press: New York, 1993, p. 365.
58. Kagawa, K.; Kawai, K.; Tani, M. and Kobayashi, T., Appl. Spectrosc., 1994, 48, 198.
59. Haisch, C. and Panne, U., Atomic Spectrosc., 1997, 9/3, 8-14.
60. Haisch, C.; Niessner, R.; Matveev, O. I.; Panne, U. and Omenetto, N., Anal. Chem., 1996, 356, 21.
61. Nordstrom, R. J., Appl. Spectrosc., 1995, 49, 1490-1499.
62. Schechter, I., Anal. Science & Technol., 1995, 8, 779.
63. Poulan, D. E. and Alexander, D.R., Appl. Spectrosc., 1995, 49, 569-579.
64. Neuhauser, R.E.; Panne, U.; Niessner, R.; Petricci, G.A.; Cavali, P. and Omenetto,N., Anal. Chim. Acta, 1997, 346, 37-48.
65. Voigtman, E., Appl. Spectrosc., 1991, 45, 237-241.
66. Liu, D. L.; Johnson, P. R. and Elimelech, M., Environ. Sci. Technol. 1995, 29, 2963.
67. Seaman, J. C.; Bertsch, P. M. and Miller, W. P., Environ. Sci. Technol. 1995, 29, 1808.
68. Grolimund, D.; Brokovec, M.; Barmettler, K. and Sticher, H., Environ. Sci. Technol., 1996, 30, 3118.
69. Horowitz, A. J.; Lum, K. R.; Garbarino, J.R.; Hall, G. E. M.; Lemieux, C. and Demas, C. R., Environ. Sci. Technol. 1996, 30, 954.
70. Haisch, C.; Liermann, J.; Panne, U. and Niessner, R., Anal. Chim. Acta, 1997, 346, 23-35.
71. Radziemski, L. J., Microchim. J., 1994, 50, 218.
72. Knopp, R.; Scherbaum, F. J. and Kim, J. I., Fresenius' J. Anal. Chem., 1996, 355, 16.
73. Kitamori, T.; Matsui, T.; Sakagami, M. and Sawada, T., Chem. Lett., 1989, 2205-2208.
74. Noll, R.; Sattmann, R, and Sturm, V., Proc. Int. Soc. Opt. Eng. (SPIE), 1994, 2248, 50.
75. Jensen, L.C.; Langford, S. C.; Dickinson, J.T. and Addleman, R. S., Spectrochim. Acta., 1995, 50B, 1501.
76. Nemet, B. and Kozma, L., Spectrochim. Acta B, 1995, 50, 1869.
77. Simeonsson, J. B. and Miziolek, A.W., Appl. Phys., 1994, 59B, 1.
78. Cheung, H.H. and Yeung, E.S., Anal. Chem., 1994, 66, 929.
79. Cheung, N.H. and Yeung, E. S. Appl. Spectrosc. 1993, 7, 882-886.
80. Cremers, D.A.; Barefield II, J.E. and Koskelo, A.C., Appl. Spectrosc., 1995, 49, 857.
81. Saggese, S. and Greenwall, R., Proc. Int. Soc. Opt. Eng.( SPIE), 1997, 2836, 195-295.
82. Marquardt, B.J.; Goode, S.R. and Angel, S.M., Anal. Chem., 1996, 68, 977.
83. Yamamoto, K.J.; Cremers, D.A.; Ferris, M.J. and Foster, L.E., Appl. Spectrosc., 1996, 50, 222.
84. Cremers, D. A.; Ferris, M. J. and Davies, M., Proc. Int. Soc. Opt. Eng. (SPIE), 1997, 2835, 190-200.
85. Anglos, D.; Couris, S. and Fotakis, C., Appl. Spectrosc., 1997, 51, 1025.
86. Ernst, W.E.; Farson, D.F., and Sames, D.J., Appl. Spectrosc., 1996, 50, 306.
87. Kim, D.E.; Yoo, K.J.; Park, H.K.; Oh, K.J. and Kim, D.W., Appl. Spectrosc., 1997, 51, 22.
88. Gornushkin,I.B.; Kim, J.E.; Smith, B.W., Baker, S.A. and Winefordner, J.D., Appl. Spectrosc., 1997 51, 1055.
89. Pakhomov, A.V.; Nichols, W. and Borysow, J., Appl. Spectrosc., 1996, 50, 880.
90. Zhang, H.; Singh, J.P.; Yueh, F.Y. and Cook, R.L., Appl. Spectrosc., 1995, 49, 1617.
91. González, A.; Ortiz, M. and Campos, J., Appl. Spectrosc., 1995, 49, 1632.
92. Häkkänen, H.J. and Korppi-Tommola, J.E.I., Appl. Spectrosc., 1995, 49, 1721.