Spectrochemical analysis of liquids using laser-induced plasma emissions: Effects of laser wavelength

Applied Spectroscopy

Volumn 51, Issue 1, 1997, Pages 87-91

  Ho, W F ^a   Ng, C W ^a   Cheung, N H ^a  

^a HONG KONG BAPTIST UNIVERSITY   (Hong Kong)

Author keywords

193 nm laser; 532 nm laser; Atomic emission spectroscopy; Laser induced plasma; Spectrochemical analysis of liquids

Indexed keywords

ATOMIC SPECTROSCOPY; LASER ABLATION; LASER PRODUCED PLASMAS; PULSED LASER APPLICATIONS; SIGNAL TO NOISE RATIO; SOLUTIONS;

PLASMA CONTINUUM EMISSIONS;

SPECTROSCOPIC ANALYSIS;

EID: 0030643873     PISSN: 00037028     EISSN: None     Source Type: Journal    
DOI: 10.1366/0003702971938812     Document Type: Article

References (17)

1. For a recent review, see R. E. Russo, Appl. Spectrosc. 49, 14A (1995).
2. T. R. Loree and L. J. Radziemski, J. Plasma Chem. and Plasma Proc. 1, 271 (1981).
3. R. Nordstrom, Lasers and Optronics, December, 23 (1993).
4. See for example two reviews: V. Majidi and M. R. Joseph, Crit. Reviews Anal. Chem. 23, 143 (1992); and T. L. Thiem, Y.-I. Lee, and J. Sneddon, Microchem. J. 45, 1 (1992).
5. See for example two reviews: V. Majidi and M. R. Joseph, Crit. Reviews Anal. Chem. 23, 143 (1992); and T. L. Thiem, Y.-I. Lee, and J. Sneddon, Microchem. J. 45, 1 (1992).
6. D. A. Cremers, L. J. Radziemski, and T. R. Loree, Appl. Spectrosc. 38, 721 (1984).
7. J. R. Wachter and D. A. Cremers, Appl. Spectrosc. 41, 1042 (1987).
8. H. A. Archontaki and S. R. Crouch, Appl. Spectrosc. 42, 741 (1988).
9. M. C. Boiron, J. Dubessy, N. Andre, A. Briand, J. L. Lacour, P. Mauchien, and J. M. Mermet, Geochimica et Cosmochimica Acta 55, 917 (1992).
10. L. J. Radziemski, T. R. Loree, D. A. Cremers, and N. M. Huffman, Anal. Chem. 55, 1246 (1983).
11. P. Gu, Q. H. Lou, N. H. Cheung, S. C. Chen, Z. Y. Wang, and P. K. Lim, Appl. Phys. B58, 143 (1994).
12. A. D. Sappey and N. S. Nogar, "Diagnostic Studies of Laser Ablation for Chemical Analysis", in Laser Ablation, J. C. Miller, Ed. (Springer, New York 1994).
13. D. S. Thomson and D. M. Murphy, Appl. Opt. 32, 6818 (1993).
14. H. S. Kwok, D. T. Shaw, Q. Y. Ying, J. P. Zheng, H. S. Kim, and N. H. Cheung, "Physics of in-situ Oxide Superconducting Thin Films Deposition", in Superconductivity and Applications, H. S. Kwok et al., Eds. (Plenum, New York 1990).
15. V. Kachel, H. Fellner-Feldegg, and E. Menke, "Hydrodynamic Properties of Flow Cytometry", in Flow Cytometry and Sorting, M. R. Melamed, T. Lindmo, and M. L. Mendelsohn, Eds. (Wiley-Liss, New York, 1990), 2nd ed.
16. N. H. Cheung and E. S. Yeung, Appl. Spectrosc. 47, 882 (1993).
17. N. H. Cheung and E. S. Yeung, Anal. Chem. 66, 929 (1994).