Thin oxides on passivated silicon irradiated by focused ion beams

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 17, Issue 6, 1999, Pages 3068-3071

  Fuhrmann, H ^a   Dobeli M ^a   Kotz R ^b   Muhle R ^a   Schnyder, B ^b  

^a ETH ZURICH   (Switzerland)

^b PAUL SCHERRER INSTITUTE   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0039523254     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.590956     Document Type: Article

References (7)

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