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Applied Physics Letters

Volumn 78, Issue 14, 2001, Pages 2000-2002

Athermal annealing of low-energy boron implants in silicon

(6) Donnelly, D W a Covington, B C a Grun, J b Fischer, R P b Peckerar, M b Felix, C L b

a TEXAS STATE UNIVERSITY (United States)

b NAVAL RESEARCH LABORATORY (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0039147464 PISSN: 00036951 EISSN: None Source Type: Journal
DOI: 10.1063/1.1359784 Document Type: Article

Times cited : (10)

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