Microstructure and growth kinetics of the Mo5Si3 and Mo3Si layers in MoSi2/Mo diffusion couple

Intermetallics

Volumn 11, Issue 7, 2003, Pages 687-696

  Yoon, Jin Kook ^a   Lee, Jong Kwon ^a   Lee, Kyung Hwan ^b   Byun, Ji Young ^a   Kim, Gyeung Ho ^a   Hong, Kyung Tae ^a  

^a Korea Institute of Science and Technology   (South Korea)

^b Korea University   (South Korea)

Author keywords

A. Molybdenum silicides; B. Diffusion; C. Crystal growth; D. Microstructure

Indexed keywords

ANNEALING; CHEMICAL VAPOR DEPOSITION; CRYSTAL GROWTH; CRYSTAL MICROSTRUCTURE; DIFFUSION; FIELD EMISSION MICROSCOPES; OPTICAL MICROSCOPY; OXIDATION; SCANNING ELECTRON MICROSCOPY; SUBSTRATES; TRANSMISSION ELECTRON MICROSCOPY;

DIFFUSION COUPLES;

MOLYBDENUM COMPOUNDS;

EID: 0038803795     PISSN: 09669795     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0966-9795(03)00068-2     Document Type: Article

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