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Volumn 100, Issue 2, 2003, Pages 142-146
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The characteristics of photo-CVD SiO2 and its application on SiC MIS UV photodetectors
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Author keywords
Metal insulator semiconductor (MIS); Photo CVD; SiC; SiO2
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Indexed keywords
CHEMICAL VAPOR DEPOSITION;
DEUTERIUM;
ELECTRIC FIELD EFFECTS;
FILM PREPARATION;
INDIUM COMPOUNDS;
INTERFACES (MATERIALS);
LEAKAGE CURRENTS;
PHOTOCURRENTS;
PHOTODETECTORS;
SCHOTTKY BARRIER DIODES;
SILICON CARBIDE;
DARK CURRENTS;
SILICA;
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EID: 0038790153
PISSN: 09215107
EISSN: None
Source Type: Journal
DOI: 10.1016/S0921-5107(03)00087-4 Document Type: Article |
Times cited : (7)
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References (12)
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