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Volumn 100, Issue 2, 2003, Pages 142-146

The characteristics of photo-CVD SiO2 and its application on SiC MIS UV photodetectors

Author keywords

Metal insulator semiconductor (MIS); Photo CVD; SiC; SiO2

Indexed keywords

CHEMICAL VAPOR DEPOSITION; DEUTERIUM; ELECTRIC FIELD EFFECTS; FILM PREPARATION; INDIUM COMPOUNDS; INTERFACES (MATERIALS); LEAKAGE CURRENTS; PHOTOCURRENTS; PHOTODETECTORS; SCHOTTKY BARRIER DIODES; SILICON CARBIDE;

EID: 0038790153     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0921-5107(03)00087-4     Document Type: Article
Times cited : (7)

References (12)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.