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Volumn 3, Issue , 2003, Pages

Design, fabrication and modeling of microbeam structures for gas sensor applications in CMOS technology

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL SENSORS; CMOS INTEGRATED CIRCUITS; DRY ETCHING; FABRICATION; FINITE ELEMENT METHOD; MICROPROCESSOR CHIPS; MICROSTRUCTURE; SORPTION; VAPORS;

EID: 0038758819     PISSN: 02714310     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper
Times cited : (7)

References (8)
  • 1
    • 0032163667 scopus 로고    scopus 로고
    • The electronic nose in Lilliput
    • September
    • H. Baltes, D. Lange, A. Koll, "The electronic nose in Lilliput" IEEE Spectrum, September 1998, pages 35-38.
    • (1998) IEEE Spectrum , pp. 35-38
    • Baltes, H.1    Lange, D.2    Koll, A.3
  • 3
    • 0028513983 scopus 로고
    • Choosing polymer coatings for chemical sensors
    • R. A. McGill, M. H. Abraham, J. W. Grate, "Choosing polymer coatings for chemical sensors", CHEMTECH 24 (1994), pages 27-37.
    • (1994) CHEMTECH 24 , vol.24 , pp. 27-37
    • McGill, R.A.1    Abraham, M.H.2    Grate, J.W.3
  • 5
    • 0038789549 scopus 로고    scopus 로고
    • Carnegie Mellon University web page: http://www.ece.cmu.edu/research/chips/openhouse/Gary.pdf
  • 6
    • 0034250942 scopus 로고    scopus 로고
    • Laminated, sacrificial-poly MEMS technology in standard CMOS
    • D. F. Guillou, S. Santhanam, L.R.Carley. "Laminated, sacrificial-poly MEMS technology in standard CMOS". Sensors and Actuators 85 (2000), pages 346-355.
    • (2000) Sensors and Actuators , vol.85 , pp. 346-355
    • Guillou, D.F.1    Santhanam, S.2    Carley, L.R.3
  • 7
    • 0038112556 scopus 로고    scopus 로고
    • Personal communication from Dr. Gary Fedder, Carnegie Melon University, USA
    • Personal communication from Dr. Gary Fedder, Carnegie Melon University, USA.
  • 8
    • 0027677605 scopus 로고
    • Thermally exited silicon oxide beam and bridge resonators in CMOS technology
    • October
    • O. Brand, H. Baltes. "Thermally exited silicon oxide beam and bridge resonators in CMOS technology". IEEE Transactions on electron devices, vol. 40, no. 10, October 1993, pp. 1745-1753.
    • (1993) IEEE Transactions on Electron Devices , vol.40 , Issue.10 , pp. 1745-1753
    • Brand, O.1    Baltes, H.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.