Optimization of Au mask fabrication process for LIGA applications

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4936, Issue , 2002, Pages 356-364

  Shan, X C ^a,b   Maeda, R ^a   Ikehara, T ^a   Mekaru, H ^c   Hattori, T ^c  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

^b SINGAPORE INSTITUTE OF MANUFACTURING TECHNOLOGY   (Singapore)

^c UNIVERSITY OF HYOGO   (Japan)

Author keywords

Au mask; ECR etching; Hot embossing and optical switch; LIGA process; Mold; X ray

Indexed keywords

ELECTRON CYCLOTRON RESONANCE; ELECTROPLATING; ETCHING; GOLD; MICROSTRUCTURE; OPTICAL SWITCHES; X RAY LITHOGRAPHY;

OPTICAL NETWORKS;

MASKS;

EID: 0038755162     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.471926     Document Type: Conference Paper

References (6)

1. J. Hecht, Laser Focus World, pp. 189-196, May 2000.
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4. For example, http://www.cmf.rl.ac.uk/list1/liga.htm
5. Y. Hashiura, R. Maeda and T. Ikehara: Proc. of SPIE, Adelaide, Australia, 2001, p.414
6. H.Mekaru, Y. Utsumi and T. Hattori: Nucl. Instrum. & Methods A, 467-8, pp741-744, (2001)