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Volumn 216, Issue 1-4 SPEC., 2003, Pages 8-14

Coexistence of passive and active oxidation for O 2 /Si(0 0 1) system observed by SiO mass spectrometry and synchrotron radiation photoemission spectroscopy

(3) Teraoka, Yuden a Moritani, Kousuke a,b Yoshigoe, Akitaka a

a JAPAN ATOMIC ENERGY AGENCY (Japan)

b OSAKA UNIVERSITY (Japan)

Author keywords

Oxidation; Oxygen molecule; Photoemission spectroscopy; Si(0 0 1); SiO; Synchrotron radiation

Indexed keywords

CHEMISORPTION; DESORPTION; DIMERS; MASS SPECTROMETRY; MOLECULAR BEAMS; OXIDATION; OXYGEN; PHOTOEMISSION; SILICA; SURFACE REACTIONS; SYNCHROTRON RADIATION; THERMAL EFFECTS;

PHOTOEMISSION SPECTROSCOPY;

SEMICONDUCTING SILICON;

EID: 0038747946 PISSN: 01694332 EISSN: None Source Type: Journal
DOI: 10.1016/S0169-4332(03)00479-3 Document Type: Conference Paper

Times cited : (8)

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