Plasma carbonitriding of cemented carbide substrate as an effective pretreatment process for diamond CVD

Surface and Coatings Technology

Volumn 112, Issue 1-3, 1999, Pages 189-193

  Sato, Takayasu ^a   Hosokawa, Yukio ^a   Ito, Shigeru ^a   Akashi, Kazuo ^a  

^a TOKYO UNIVERSITY OF SCIENCE   (Japan)

Author keywords

Cemented carbide; Diamond CVD; Plasma carbonitriding

Indexed keywords

ADHESION; CARBIDES; CARBONITRIDING; CHEMICAL VAPOR DEPOSITION; COBALT; DECARBURIZATION; DECOMPOSITION; DIFFUSION IN SOLIDS; ETCHING; NITROGEN; PLASMA APPLICATIONS; SUBSTRATES;

CEMENTED CARBIDES;

DIAMOND FILMS;

EID: 0033075178     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(98)00753-1     Document Type: Article

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