Model for ion extraction from pulsed plasma source for plasma based ion implantation (PBII)

Review of Scientific Instruments

Volumn 71, Issue 2 II, 2000, Pages 1187-1190

  Masamune, Sadao ^a   Yukimura, Ken ^b  

^a KYOTO INSTITUTE OF TECHNOLOGY   (Japan)

^b DOSHISHA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001585354     PISSN: 00346748     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1150423     Document Type: Article

References (7)

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2. W. Möller, in Advanced Technologies Based on Wave and Beam Generated Plasmas, edited by H. Schlüter, and A. Shivarova (Kluwer, Dordrecht, 1999).
3. M. Tuszewski et al., Surf. Coat. Technol. 93, 203 (1997).
4. K. Yukimura et al., J. Vac. Sci. Technol. B 17, 871 (1999).
5. M. Lieberman, J. Appl. Phys. 66, 2926 (1989).
6. J. R. Conrad, J. Appl. Phys. 62, 4591 (1987).
7. J. T. Scheuer et al., J. Appl. Phys. 67, 1241 (1990).