Hybrid optical proximity correction - Concepts and results

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4889, Issue 2, 2002, Pages 1173-1180

  Hung, Meg ^a   Balasingam, Pratheep ^a  

^a Numerical Technologies Inc   (Japan)

Author keywords

Optical proximity correction; Subwavelength mask

Indexed keywords

COMPUTER SIMULATION; DATA REDUCTION; LITHOGRAPHY; MASKS;

OPTICAL PROXIMITY CORRECTION;

INTEGRATED CIRCUIT MANUFACTURE;

EID: 0038641947     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.468204     Document Type: Article

References (2)

1. A. K. Wong, etc, "Lithographic effects of mask critical dimension error", SPIE 1998, vol. 3334
2. J. Randall, "Reduction of mask induced CD errors by optical proximity correction", SPIE 1998, vol. 3334.