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0038596671
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note
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1H NMR, HRMS elemental analysis, and IR), see the Supporting Information.
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10
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0038502058
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note
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11-to-footprint distance in the earlier tripods (ref 4a) was 15-18 Å.
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11
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84975586071
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19
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0034636573
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As others, we observed a minor (in all cases <10%) slow injection component that extends to hundreds of picoseconds. The measured rate of this residual process is very sensitive to slight baseline drifts. For this reason we chose not to interpret it here. For examples of multiexponential injection kinetics, see: (a) Wang, Y.; Asbury, J. B.; Lian, T. J. Phys. Chem. A 2000, 104, 4291. (b) Asbury, J. B.; Ellingson, R. J.; Ghosh, H. N.; Ferrere, S.; Nozik, A. J.; Lian, T. J. Phys. Chem. B 1999, 103, 3110. (c) Tachibana, Y.; Haque, S. A.; Mercer, I. P.; Moser, J. E.; Klug, D. R.; Durrant, J. R. J. Phys. Chem. B 2001, 105, 7424. (d) Tachibana, Y.; Haque, S. A.; Mercer, I. P.; Durrant, J. R.; Klug, D. R. J. Phys. Chem. B 2000, 104, 1198.
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Wang, Y.1
Asbury, J.B.2
Lian, T.3
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20
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0001093055
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As others, we observed a minor (in all cases <10%) slow injection component that extends to hundreds of picoseconds. The measured rate of this residual process is very sensitive to slight baseline drifts. For this reason we chose not to interpret it here. For examples of multiexponential injection kinetics, see: (a) Wang, Y.; Asbury, J. B.; Lian, T. J. Phys. Chem. A 2000, 104, 4291. (b) Asbury, J. B.; Ellingson, R. J.; Ghosh, H. N.; Ferrere, S.; Nozik, A. J.; Lian, T. J. Phys. Chem. B 1999, 103, 3110. (c) Tachibana, Y.; Haque, S. A.; Mercer, I. P.; Moser, J. E.; Klug, D. R.; Durrant, J. R. J. Phys. Chem. B 2001, 105, 7424. (d) Tachibana, Y.; Haque, S. A.; Mercer, I. P.; Durrant, J. R.; Klug, D. R. J. Phys. Chem. B 2000, 104, 1198.
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Asbury, J.B.1
Ellingson, R.J.2
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Ferrere, S.4
Nozik, A.J.5
Lian, T.6
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21
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0035833794
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As others, we observed a minor (in all cases <10%) slow injection component that extends to hundreds of picoseconds. The measured rate of this residual process is very sensitive to slight baseline drifts. For this reason we chose not to interpret it here. For examples of multiexponential injection kinetics, see: (a) Wang, Y.; Asbury, J. B.; Lian, T. J. Phys. Chem. A 2000, 104, 4291. (b) Asbury, J. B.; Ellingson, R. J.; Ghosh, H. N.; Ferrere, S.; Nozik, A. J.; Lian, T. J. Phys. Chem. B 1999, 103, 3110. (c) Tachibana, Y.; Haque, S. A.; Mercer, I. P.; Moser, J. E.; Klug, D. R.; Durrant, J. R. J. Phys. Chem. B 2001, 105, 7424. (d) Tachibana, Y.; Haque, S. A.; Mercer, I. P.; Durrant, J. R.; Klug, D. R. J. Phys. Chem. B 2000, 104, 1198.
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J. Phys. Chem. B
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Tachibana, Y.1
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Moser, J.E.4
Klug, D.R.5
Durrant, J.R.6
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22
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0001065383
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As others, we observed a minor (in all cases <10%) slow injection component that extends to hundreds of picoseconds. The measured rate of this residual process is very sensitive to slight baseline drifts. For this reason we chose not to interpret it here. For examples of multiexponential injection kinetics, see: (a) Wang, Y.; Asbury, J. B.; Lian, T. J. Phys. Chem. A 2000, 104, 4291. (b) Asbury, J. B.; Ellingson, R. J.; Ghosh, H. N.; Ferrere, S.; Nozik, A. J.; Lian, T. J. Phys. Chem. B 1999, 103, 3110. (c) Tachibana, Y.; Haque, S. A.; Mercer, I. P.; Moser, J. E.; Klug, D. R.; Durrant, J. R. J. Phys. Chem. B 2001, 105, 7424. (d) Tachibana, Y.; Haque, S. A.; Mercer, I. P.; Durrant, J. R.; Klug, D. R. J. Phys. Chem. B 2000, 104, 1198.
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J. Phys. Chem. B
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Tachibana, Y.1
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