Influence of nucleation parameters on growth of diamond thin films by hybrid hot filament CVD

Diamond and Related Materials

Volumn 12, Issue 3-7, 2003, Pages 356-360

  Kromka, A ^a,b   Danis T ^b   Balon, F ^b   Janik J ^b   Vanecek M ^a  

^a INSTITUTE OF PHYSICS   (Czech Republic)

^b SLOVAK UNIVERSITY OF TECHNOLOGY   (Slovakia)

Author keywords

Diamond; Hot filament CVD; Nucleation; Simulation

Indexed keywords

CHEMICAL REACTORS; CHEMICAL VAPOR DEPOSITION; ELECTRIC POTENTIAL; FILM GROWTH; ION BOMBARDMENT; NUCLEATION; SCANNING ELECTRON MICROSCOPY; SUBSTRATES; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

HOT FILAMENT CHEMICAL VAPOR DEPOSITION (HFCVD);

DIAMOND FILMS;

DIAMOND;

EID: 0038577143     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0925-9635(02)00279-0     Document Type: Article

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