Roles of hydrogen and oxygen in the direct nitridation of silicon

Industrial and Engineering Chemistry Research

Volumn 42, Issue 12, 2003, Pages 2434-2440

  Pavarajarn, Varong ^a   Kimura, Shoichi ^a  

^a Oregon State University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

HYDROGEN; IMPURITIES; OXYGEN; PROTECTIVE COATINGS;

NITRIDATION;

SILICON;

HYDROGEN; OXIDE; OXYGEN; SILICON; SILICON DERIVATIVE; SILICON DIOXIDE;

COATING; HYDROGEN; NITRIDING; OXYGEN; PROTECTION; SILICON;

ARTICLE; CHEMICAL MODIFICATION; CHEMICAL REACTION; CONCENTRATION (PARAMETERS); GAS; HIGH TEMPERATURE; NITRIDATION; SOLID; SURFACE PROPERTY;

EID: 0038549019     PISSN: 08885885     EISSN: None     Source Type: Journal    
DOI: 10.1021/ie020547h     Document Type: Article

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