Effect of surface treatment of Si substrate on the crystal structure of FeSi2 thin film formed by ion beam sputter deposition method

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 206, Issue , 2003, Pages 313-316

  Haraguchi, M ^a   Yamamoto, H ^b   Yamaguchi, K ^b   Nakanoya, T ^b   Saito, T ^b   Sasase, M ^c   Hojou, K ^b  

^a IBARAKI UNIVERSITY   (Japan)

^b JAPAN ATOMIC ENERGY AGENCY   (Japan)

^c WAKASA WAN ENERGY RESEARCH CENTER   (Japan)

Author keywords

FeSi2; Cross sectional observation; Crystal structure; Ion beam sputter deposition; Surface treatment

Indexed keywords

CRYSTAL STRUCTURE; ETCHING; ION BEAM ASSISTED DEPOSITION; IRON COMPOUNDS; SILICON; SUBSTRATES; SURFACE TREATMENT; TRANSMISSION ELECTRON MICROSCOPY; ULTRAHIGH VACUUM; X RAY DIFFRACTION ANALYSIS;

THERMAL ETCHING;

THIN FILMS;

EID: 0038485531     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(03)00752-3     Document Type: Conference Paper

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