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Surface and Coatings Technology

Volumn 169-170, Issue , 2003, Pages 262-265

CVD diamond coating on WC-Co cutting tool using ECR MPCVD apparatus via electrophoretic seeding pretreatment

(6) Tsubota, Toshiki a Ida, Shintaro b Okada, Naoki b Nagata, Masanori a Matsumoto, Yasumichi b Yatsushiro, Nobumitsu c

a KUMAMOTO INDUSTRIAL RESEARCH INSTITUTE (Japan)

b KUMAMOTO UNIVERSITY (Japan)

c Kumabou Metal (Japan)

Author keywords

Carbon; Electron cyclotron resonance (ECR) plasmas; Hydrogen; Methane; Scanning electron microscopy (SEM); Tungsten carbide

Indexed keywords

CHEMICAL VAPOR DEPOSITION; COBALT; CUTTING TOOLS; ELECTROPHORESIS; TUNGSTEN CARBIDE;

DIAMOND PARTICLES;

DIAMOND FILMS;

COATING; CUTTING TOOL; DIAMOND COATING; SURFACE TREATMENT; VAPOR DEPOSITION;

EID: 0038469748 PISSN: 02578972 EISSN: None Source Type: Journal
DOI: 10.1016/S0257-8972(03)00033-1 Document Type: Article

Times cited : (11)

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