The role of a top oxide layer in cavities formed by MeV He implantation into Si

EPJ Applied Physics

Volumn 23, Issue 1, 2003, Pages 45-48

  Liu, C ^a   Ntsoenzok, E ^a   Delamare, R ^a   Alquier, D ^b   Regula, G ^c  

^a CRNS   (France)

^b LMP   (France)

^c AIX MARSEILLE UNIVERSITY   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; COMPUTER SIMULATION; POINT DEFECTS; SECONDARY ION MASS SPECTROMETRY; SEMICONDUCTING SILICON; STACKING FAULTS; TEMPERATURE; TRANSMISSION ELECTRON MICROSCOPY;

CROSS-SECTIONAL TRANSMISSION ELECTRON MICROSCOPY; DISLOCATION LOOPS; HELIUM IMPLANTATION;

ION IMPLANTATION;

EID: 0038447240     PISSN: 12860042     EISSN: None     Source Type: Journal    
DOI: 10.1051/epjap:2003038     Document Type: Article

References (16)

1. C.C. Griffioen, J.H. Evans, P.C. de Jong, A. Van Veen, Nucl. Instrum. Methods B 27, 417 (1987)
2. S. Godey, T. Sauvage, E. Ntsoenzok, H. Erramli, M.F. Beaufort, J.F. Barbot, B. Leroy, J. Appl. Phys. 87, 2158 (2000)
3. D.M. Follstaedt, S.M. Myers, J.C. Barbour, G.A. Petersen, J.L. Rens, L.R. Dawson, S.R. Lee, Nucl. Instrum. Methods B 160, 476 (2000)
4. J. Wong-Leung, C.E. Ascheron, M. Peteavic, R.G. Elliman, J.S. Williams, Appl. Phys. Lett. 66, 1231 (1995)
5. V. Raineri, A. Battaglia, E. Riminis, Nucl. Instrum. Methods B 96, 249 (1995)
6. S.M. Myers, D.M. Follstaedt, G.A. Petersen, C.H. Seager, H.J. Stein, W.R. Wampler, Nucl. Instrum. Methods B 106, 379 (1995)
7. J.S. Williams, M.J. Conway, J. Wong-Leung, et al., Appl. Phys. Lett. 25, 2424 (1999)
8. J.H. Evans, A. Van Veen, C.C. Griffioen, Nucl. Instrum. Methods B 28, 360 (1987)
9. V. Raineri, S. Ginffruda, E. Riminis, Solid State Phenom. 82-84, 273 (2002)
10. H. Schroeder, P.F.P. Fichtner, H. Trinkaus, Fundamental Aspects of Inert Gases in Solids, edited by S.E. Donnelly, J.H. Evans (Plenum Press, New York, 1991), Vol. 279, p. 289
11. V. Raineri, M. Saggio, E. Riminis, J. Mater. Res. 15, 1449 (2000)
12. S. Godey, Ph.D. Thesis, University of Orléans, France, 1999
13. J.F. Ziegler, J.P. Biersack, U. Littmark, The stopping, rang of ions in solids (Pergamon, New York, 1985)
14. T.W. Sigmon, W.K. Chu, E. Lugujjo, J.W. Mayer, Appl. Phys. Lett. 24, 105 (1974)
15. W.L. Harrington, R.E. Honing, A.M. Goodman, R. Williams, Appl. Phys. Lett. 27, 644 (1975)
16. R.A. Clarke, R.L. Tapping, M.A. Hopper, L. Young, J. Electrochem. Soc. 122, 1347 (1975)