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Volumn 18, Issue 16 SPEC ISS., 2003, Pages 2903-2919

The silicon lattice accelerator

Author keywords

a,c silica; Damage; Figures of merit; Impedances; Lasers; Luminosity; Next generation lithography; Parallel serial structures; Silicon; Transmissive reflective modes

Indexed keywords

SILICON; SILICON DIOXIDE;

EID: 0038444288     PISSN: 0217751X     EISSN: None     Source Type: Journal    
DOI: 10.1142/S0217751X03016367     Document Type: Conference Paper
Times cited : (5)

References (21)
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  • 2
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    • note
    • Power sources are presently available that could provide higher gradients than RF under this scenario at 50 MHz rep rates e.g. see the IMRA America, Inc. website.
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    • note
    • UV grade Fused Silica from CVI Laser Corp. was made by flame hydrolysis of silicon tetrachloride. Their catalog designation is RAP-50-UV.
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.