Ion beam mixing in Fe/Si and Ta/Si bilayers: Possible effects of ion charges

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 205, Issue , 2003, Pages 741-745

  Dhar, S ^a   Schaaf, P ^a   Lieb, K P ^a   Bibic N ^b   Milosavljevic M ^b   Sajavaara, T ^c   Keinonen, J ^c   Traverse, A ^d  

^a UNIVERSITY OF GÖTTINGEN   (Germany)

^b UNIVERSITY OF BELGRADE   (Serbia)

^c UNIVERSITY OF HELSINKI   (Finland)

^d UNIVERSITÉ PARIS SACLAY   (France)

Author keywords

Highly charged ion; Ion beam mixing; Ion irradiation; RBS; TOF ERDA

Indexed keywords

CRYSTAL ORIENTATION; ION BOMBARDMENT; MAGNETRON SPUTTERING; POSITIVE IONS; RUTHERFORD BACKSCATTERING SPECTROSCOPY;

ION BEAM MIXING;

ION BEAMS;

EID: 0038331869     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(03)00578-0     Document Type: Conference Paper

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