Fabrication and magnetoresistance of tunnel junctions using half-metallic Fe3O4

Journal of Applied Physics

Volumn 93, Issue 10 3, 2003, Pages 8032-8034

  Kim, Woochul ^a   Kawaguchi, Kenji ^a   Koshizaki, Naoto ^a   Sohma, Mitsugu ^a   Matsumoto, Tetsuro ^b  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

^b SAITAMA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINA; ATOMIC FORCE MICROSCOPY; ELECTRIC INSULATORS; INTERFACES (MATERIALS); MAGNESIA; MAGNETORESISTANCE; MOLECULAR BEAM EPITAXY; MULTILAYERS; REFLECTION HIGH ENERGY ELECTRON DIFFRACTION; SQUIDS; TUNNEL JUNCTIONS; X RAY DIFFRACTION;

CHEMICAL PROPERTIES;

FERROMAGNETIC MATERIALS;

EID: 0038317624     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1557337     Document Type: Conference Paper

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