SCOPUS 정보 검색 플랫폼

Volumn 93, Issue 10 3, 2003, Pages 8370-8372

Hard mask fabrication for magnetic random access memory elements using focused ion beam assisted selective chemical vapor deposition

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION; CARBON; CHEMICAL VAPOR DEPOSITION; ETCHING; ION BEAMS; IRRADIATION; MASKS; TUNNEL JUNCTIONS;

CARBON MASK PATTERNS;

RANDOM ACCESS STORAGE;

EID: 0038316525 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.1540058 Document Type: Conference Paper

Times cited : (5)

References (7)

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