Vapour supply manifold for additive nanolithography with electron beam induced deposition

Microelectronic Engineering

Volumn 57-58, Issue , 2001, Pages 909-913

  Koops, H W P ^a   Reinhardt, A ^a,b   Klabunde, F ^a,c   Kaya, A ^a,b   Plontke, R ^a,d  

^a DEUTSCHE TELEKOM LABORATORIES   (Germany)

^b NaWoTec GmbH   (Germany)

^c AIXTRON AG   (Germany)

^d Leica Lithography Systems   (Germany)

Author keywords

Additive nanolithography; Electron beam induced chemistry; Maskless material deposition; Maskless material etching; Vapour supply

Indexed keywords

DEPOSITION; ELECTRON BEAMS; ELECTRON TUNNELING; ETCHING; NANOSTRUCTURED MATERIALS; VAPORS;

MASKLESS MATERIAL ETCHING;

NANOTECHNOLOGY;

EID: 0035450382     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(01)00566-4     Document Type: Article

References (2)

1. High resolution electron beam induced deposition
2. Characterization and application of materials grown by electron beam induced deposition