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Zeitschrift fur Physikalische Chemie

Volumn 217, Issue 5, 2003, Pages 459-477

Structure of electrochemically deposited sulfide layers on Cu(100)

(3) Spaenig, A a Broekmann, P a Wandelt, K a

a UNIVERSITY OF BONN (Germany)

Author keywords

Copper; Electrochemistry; Solid Liquid Interfaces; STM; Sulfide; Surface Dynamics

Indexed keywords

COPPER; ELECTROCHEMISTRY; ELECTRODEPOSITION; ELECTRODES; ELECTROLYTES; HYDROGEN EVOLUTION REACTION; HYDROGEN SULFIDE; LATTICE CONSTANTS; MORPHOLOGY; PHASE INTERFACES; SULFUR COMPOUNDS; SURFACE MORPHOLOGY; SURFACE REACTIONS;

CONCENTRATION DEPENDENCE; ELECTRODE POTENTIALS; POTENTIAL DEPENDENCE; SOLID-LIQUID INTERFACES; SULFIDE; SULFIDE CONCENTRATION; SURFACE DYNAMICS; UNI-AXIAL COMPRESSION;

COPPER COMPOUNDS;

COPPER; ELECTROLYTE; HYDROGEN; SULFIDE;

ADSORPTION; ARTICLE; CHEMICAL REACTION; CHEMICAL STRUCTURE; ELECTRIC POTENTIAL; ELECTROCHEMISTRY; ELECTRODE; KINETICS; STRUCTURE ANALYSIS; SURFACE PROPERTY; TRANSPORT KINETICS;

EID: 0038292989 PISSN: 09429352 EISSN: None Source Type: Journal
DOI: 10.1524/zpch.217.5.459.20454 Document Type: Article

Times cited : (22)

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